Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.36 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.34 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.34 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.34 |
| ▸ | TLR2 | O60603 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | LCK | P06239 | 1/20 | 0.33 |
| ▸ | PPARD | Q03181 | 1/20 | 0.33 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.33 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL131696 | 0.97 | CA2 (0.39) | CA2CA1GPR84FFAR1NFKB1 | |
| SCHEMBL194208 | 0.97 | CA2 (0.39) | CA2CA1GPR84FFAR1NFKB1 | |
| SCHEMBL106263 | 0.88 | CA2 (0.39) | CA2CA1GPR84FFAR1NFKB1 | |
| SCHEMBL678322 | 0.85 | GPR84 (0.40) | GPR84FFAR1ZDHHC7MAPTLCK | |
| SCHEMBL4559352 | 0.84 | GPR84 (0.39) | GPR84FFAR1ZDHHC7MAPTLCK | |
| SCHEMBL27968380 | 0.79 | USP2 (0.41) | GPR84FFAR1ZDHHC7TLR2 | |
| SCHEMBL18831983 | 0.76 | GPR84 (0.40) | GPR84FFAR1ZDHHC7MAPTLCK | |
| SCHEMBL28432994 | 0.75 | GPR84 (0.39) | GPR84FFAR1ZDHHC7MAPTLCK | |
| SCHEMBL7161840 | 0.74 | FDPS (0.36) | GPR84FFAR1ZDHHC7TLR2 | |
| SCHEMBL27968388 | 0.73 | TSHR (0.43) | ZDHHC7TLR2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021029422-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2021-02-18 | — | — | WO | disclosed |
| EP-3229075-B1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR CORP (JP) | 2021-01-06 | — | — | EP | disclosed |
| US-20200333707-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2020-10-22 | — | — | US | disclosed |
| US-10725376-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2020-07-28 | — | — | US | disclosed |
| US-20180017864-A9 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2018-01-18 | — | — | US | disclosed |
| US-20170362412-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-12-21 | — | — | US | disclosed |
| EP-3229075-A1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR Corporation (JP) | 2017-10-11 | — | — | EP | disclosed |
| US-20170269476-A1 | PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-09-21 | — | — | US | disclosed |
| US-20170184960-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184961-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20150284539-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-10-08 | — | — | US | disclosed |
| EP-0101080-B2 | MAGNETIC RECORDING MEDIUM | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1990-09-26 | — | — | EP | disclosed |
| EP-0101080-B1 | MAGNETIC RECORDING MEDIUM | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1987-04-29 | — | — | EP | disclosed |