SCHEMBL10407367

SCHEMBL10407367

CC(Cl)c1ccccc1C(N)=O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IRAK4 Q9NWZ3 2/20 0.50
KDM4E B2RXH2 3/20 0.47
ALDH1A1 P00352 2/20 0.47
MAPT P10636 1/20 0.47
HPGD P15428 1/20 0.47
TSHR P16473 1/20 0.47
HSD17B10 Q99714 1/20 0.47
METAP2 P50579 1/20 0.44
HTT P42858 1/20 0.44
BCAT2 O15382 1/20 0.42
KEAP1 Q14145 1/20 0.42
NFE2L2 Q16236 1/20 0.42
KMT2A Q03164 1/20 0.40
ATM Q13315 1/20 0.40
GAA P10253 1/20 0.39
CTNNB1 P35222 1/20 0.39
SIRT1 Q96EB6 1/20 0.39
AURKA O14965 1/20 0.38
RPS6KB1 P23443 1/20 0.38
AURKB Q96GD4 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL105262 0.85 IRAK4 (0.55) IRAK4KDM4EALDH1A1MAPTHPGD
SCHEMBL31632660 0.85 IRAK4 (0.55) IRAK4KDM4EALDH1A1MAPTHPGD
Hydrochloric Acid SCHEMBL28294057 0.83 IRAK4 (0.53) IRAK4KDM4EALDH1A1MAPTHPGD
SCHEMBL9783644 0.83 IRAK4 (0.53) IRAK4KDM4EALDH1A1MAPTHPGD
Hydrochloric Acid SCHEMBL7849679 0.83 IRAK4 (0.53) IRAK4KDM4EALDH1A1MAPTHPGD
SCHEMBL731619 0.82 IRAK4 (0.52) IRAK4KDM4EALDH1A1MAPTHPGD
SCHEMBL1567403 0.82 ALDH1A1 (0.52) KDM4EALDH1A1MAPTHPGDTSHR
SCHEMBL305563 0.82 IRAK4 (0.52) IRAK4KDM4EALDH1A1MAPTHPGD
SCHEMBL6905434 0.82 ALDH1A1 (0.47) IRAK4ALDH1A1MAPTTSHRHTT
SCHEMBL31400625 0.82 IRAK4 (0.52) IRAK4KDM4EALDH1A1MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4891297-A STORAGE STABILITY, HIGH COLOR DENSITY FUJI PHOTO FILM CO.,LTD. (JP) 1990-01-02 US disclosed
EP-0323887-A2 Heat-sensitive diazo recording materials FUJI PHOTO FILM CO., LTD. (JP) 1989-07-12 EP disclosed