SCHEMBL10423882

SCHEMBL10423882

O=c1cccccc1Oc1cccccc1=O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.52
▸ MAPT P10636 4/20 0.52
▸ SMN1; SMN2 Q16637 1/20 0.52
▸ DBH P09172 2/20 0.43
▸ MMP2 P08253 1/20 0.43
▸ HTT P42858 3/20 0.43
▸ CA12 O43570 2/20 0.43
▸ CA1 P00915 2/20 0.43
▸ CA2 P00918 2/20 0.43
▸ CA7 P43166 2/20 0.43
▸ CA9 Q16790 2/20 0.43
▸ CA14 Q9ULX7 2/20 0.43
▸ CA4 P22748 1/20 0.43
▸ L3MBTL1 Q9Y468 3/20 0.39
▸ MAPK1 P28482 2/20 0.39
▸ ALDH1A1 P00352 2/20 0.39
▸ LTA4H P09960 1/20 0.38
▸ TSHR P16473 1/20 0.38
▸ GAA P10253 2/20 0.38
▸ GSTP1 P09211 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7227687 0.83 CA1 (0.60) KMT2AMAPTSMN1; SMN2HTTCA12
SCHEMBL11439501 0.71 ALDH1A1 (0.50) KMT2AHTTCA4L3MBTL1MAPK1
SCHEMBL10387591 0.71 PTGS2 (0.62) KMT2AMAPTSMN1; SMN2HTTMAPK1
SCHEMBL524834 0.71 MAPT (0.47) KMT2AMAPTSMN1; SMN2DBHMMP2
SCHEMBL23258867 0.71 MAPT (0.59) MAPTL3MBTL1MAPK1LTA4HGSTP1
SCHEMBL11441965 0.69 ADORA2A (0.53) KMT2AHTTLTA4HTSHRGAA
SCHEMBL11449754 0.69 CTNNB1 (0.48) KMT2AMAPTSMN1; SMN2DBHMMP2
SCHEMBL525180 0.69 MAPT (0.46) KMT2AMAPTSMN1; SMN2DBHMMP2
SCHEMBL9985549 0.69 ALDH1A1 (0.59) KMT2AMAPTSMN1; SMN2HTTL3MBTL1
SCHEMBL11442190 0.69 CA1 (0.55) KMT2AMAPTSMN1; SMN2HTTCA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4976834-A CLATHRATING, IRRADIATION DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1990-12-11 — — US disclosed
EP-0285175-A1 Asymmetric photochemical reaction process DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1988-10-05 — — EP disclosed
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