Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLA2G7 | Q13093 | 6/20 | 0.57 |
| ▸ | MIF | P14174 | 1/20 | 0.51 |
| ▸ | LMNA | P02545 | 2/20 | 0.47 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | F2 | P00734 | 1/20 | 0.44 |
| ▸ | CES2 | O00748 | 1/20 | 0.43 |
| ▸ | CES1 | P23141 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | CDK5 | Q00535 | 2/20 | 0.42 |
| ▸ | CDK5R1 | Q15078 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | TNF | P01375 | 1/20 | 0.41 |
| ▸ | KLF5 | Q13887 | 1/20 | 0.41 |
| ▸ | NOD1 | Q9Y239 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10437490 | 1.00 | PLA2G7 (0.57) | PLA2G7MIFLMNATSHRF2 | |
| SCHEMBL27783160 | 0.84 | CES2 (0.50) | PLA2G7MIFLMNACES2CES1 | |
| SCHEMBL14616995 | 0.81 | PLA2G7 (0.59) | PLA2G7MIFLMNATSHRF2 | |
| SCHEMBL2532511 | 0.78 | PLA2G7 (0.65) | PLA2G7MIFLMNATSHRF2 | |
| SCHEMBL2890648 | 0.78 | PLA2G7 (0.65) | PLA2G7MIFLMNATSHRF2 | |
| SCHEMBL10437488 | 0.76 | PLA2G7 (0.57) | PLA2G7MIFLMNATSHRF2 | |
| SCHEMBL734681 | 0.76 | PLA2G7 (0.67) | PLA2G7MIFLMNATSHRF2 | |
| SCHEMBL734682 | 0.76 | PLA2G7 (0.67) | PLA2G7MIFLMNATSHRF2 | |
| SCHEMBL9070381 | 0.75 | PLA2G7 (0.61) | PLA2G7MIFLMNATSHRF2 | |
| SCHEMBL10406729 | 0.74 | PLA2G7 (0.65) | PLA2G7MIFLMNATSHRF2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0377321-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1990-07-11 | — | — | EP | claimed |
| US-9494866-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-9411224-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-09 | — | — | US | disclosed |
| US-9411224-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-09 | — | — | US | disclosed |
| US-9405200-B2 | Resist composition and method of forming resist pattern | TOYKO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9405200-B2 | Resist composition and method of forming resist pattern | TOYKO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9377685-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| US-9377685-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| US-20150147702-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20150147702-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20130137047-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130115555-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-09 | — | — | US | disclosed |
| US-20130115555-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-09 | — | — | US | disclosed |
| US-20130084523-A1 | RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130084523-A1 | RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130078572-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130078572-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130017500-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20130017500-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |
| EP-0377321-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1990-07-11 | — | — | EP | disclosed |