Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLA2G7 | Q13093 | 6/20 | 0.65 |
| ▸ | MIF | P14174 | 1/20 | 0.57 |
| ▸ | TSHR | P16473 | 2/20 | 0.52 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | F2 | P00734 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | NPC1 | O15118 | 4/20 | 0.46 |
| ▸ | RAB9A | P51151 | 4/20 | 0.46 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | CDK5 | Q00535 | 2/20 | 0.46 |
| ▸ | CDK5R1 | Q15078 | 2/20 | 0.46 |
| ▸ | PKM | P14618 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | TNF | P01375 | 1/20 | 0.45 |
| ▸ | KLF5 | Q13887 | 1/20 | 0.45 |
| ▸ | NOD1 | Q9Y239 | 1/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2532511 | 1.00 | PLA2G7 (0.65) | PLA2G7MIFTSHRLMNAF2 | |
| SCHEMBL734682 | 0.82 | PLA2G7 (0.67) | PLA2G7MIFTSHRLMNAF2 | |
| SCHEMBL734681 | 0.82 | PLA2G7 (0.67) | PLA2G7MIFTSHRLMNAF2 | |
| SCHEMBL9070381 | 0.81 | PLA2G7 (0.61) | PLA2G7MIFTSHRLMNAF2 | |
| SCHEMBL12328534 | 0.81 | RAB9A (0.56) | PLA2G7LMNASMN1; SMN2NPC1RAB9A | |
| SCHEMBL10406729 | 0.80 | PLA2G7 (0.65) | PLA2G7MIFTSHRLMNAF2 | |
| SCHEMBL14616995 | 0.79 | PLA2G7 (0.59) | PLA2G7MIFTSHRLMNAF2 | |
| SCHEMBL3222745 | 0.78 | PLA2G7 (1.00) | PLA2G7MIFLMNAF2NPC1 | |
| SCHEMBL3222751 | 0.78 | PLA2G7 (1.00) | PLA2G7MIFLMNAF2NPC1 | |
| SCHEMBL28069049 | 0.78 | PLA2G7 (0.65) | PLA2G7MIFTSHRLMNAF2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100286211-A1 | OXAZOLIDINONE DERIVATIVES AS ANTIMICROBIALS | RANBAXY LABORATORIES LIMITED (IN) | 2010-11-11 | — | — | US | claimed |
| US-9494866-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-9411224-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-09 | — | — | US | disclosed |
| US-9411224-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-09 | — | — | US | disclosed |
| US-9405200-B2 | Resist composition and method of forming resist pattern | TOYKO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9405200-B2 | Resist composition and method of forming resist pattern | TOYKO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9377685-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| US-9377685-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| US-20150147702-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20150147702-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20130084523-A1 | RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130084523-A1 | RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |
| US-20130078572-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130078572-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130030002-A1 | FUNGICIDAL OXIMES AND HYDRAZONES | E I DUPONT DE NEMOURS AND COMPANY (US) | 2013-01-31 | — | — | US | disclosed |
| US-20130017500-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20130017500-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20100286211-A1 | OXAZOLIDINONE DERIVATIVES AS ANTIMICROBIALS | RANBAXY LABORATORIES LIMITED (IN) | 2010-11-11 | — | — | US | disclosed |
| US-20100286211-A1 | OXAZOLIDINONE DERIVATIVES AS ANTIMICROBIALS | RANBAXY LABORATORIES LIMITED (IN) | 2010-11-11 | — | — | US | disclosed |
| US-20100286211-A1 | OXAZOLIDINONE DERIVATIVES AS ANTIMICROBIALS | RANBAXY LABORATORIES LIMITED (IN) | 2010-11-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100286211-A1 | OXAZOLIDINONE DERIVATIVES AS ANTIMICROBIALS | OXA1L, PDK4, MLYCD | PLA2G7 4269/4885MIF 1105/4885TSHR 1017/4885 |
| US-20130030002-A1 | FUNGICIDAL OXIMES AND HYDRAZONES | NOX1, QSOX1, XDH | PLA2G7 1042/4885MIF 3570/4885TSHR 4101/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.