Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Ethyl Propionate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGAM | O43451 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | SI | P14410 | 1/20 | 0.43 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.38 |
| ▸ | NAAA | Q02083 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.33 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethyl Propionate SCHEMBL303995 | 0.94 | MGAM (0.48) | MGAMGAASIMGAM2ALDH1A1 | |
| Ethyl Propionate SCHEMBL4580029 | 0.93 | MGAM (0.38) | MGAMGAASIMGAM2ALDH1A1 | |
| Ethyl Propionate SCHEMBL4580712 | 0.90 | GAA (0.39) | MGAMGAASIMGAM2ALDH1A1 | |
| Propylene Glycol SCHEMBL445696 | 0.87 | NAAA (0.44) | GAAALDH1A1TDP1NAAALMNA | |
| Ethyl Propionate SCHEMBL2900869 | 0.85 | GAA (0.57) | MGAMGAASIMGAM2ALDH1A1 | |
| Propylene Glycol SCHEMBL7038031 | 0.85 | MAPT (0.43) | MGAMGAASIMGAM2ALDH1A1 | |
| Ethyl Propionate SCHEMBL4579613 | 0.84 | CYP2D6 (0.37) | MGAMGAASIMGAM2ALDH1A1 | |
| Propylene Glycol SCHEMBL443947 | 0.84 | NAAA (0.55) | ALDH1A1NAAALMNAMAPTTSHR | |
| Propylene Glycol SCHEMBL460711 | 0.83 | TDP1 (0.46) | ALDH1A1TDP1NAAAMAPTTSHR | |
| Ethyl Propionate SCHEMBL28313478 | 0.83 | GAA (0.55) | MGAMGAASIMGAM2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1045 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| CN-118284852-A | Composition and method for improving metal structure fabrication by wet chemical etching | 默克专利股份有限公司 | 2024-07-02 | — | — | CN | claimed |
| CN-118284854-A | Positive ultra-thick photoresist composition | 默克专利股份有限公司 | 2024-07-02 | — | — | CN | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| CN-115485622-A | DNQ-free chemically amplified resist compositions | 默克专利股份有限公司 | 2022-12-16 | — | — | CN | claimed |
| CN-112654928-A | Positive photosensitive material | 默克专利股份有限公司 | 2021-04-13 | — | — | CN | claimed |
| CN-111518638-A | Dry cleaning solvent and preparation process thereof | 乔卫峰 | 2020-08-11 | — | — | CN | claimed |
| EP-2146246-B1 | Negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-28 | — | — | EP | claimed |
| EP-1791025-B1 | Negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-06-12 | — | — | EP | claimed |
| US-8193307-B2 | Synthesis of photoresist polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-05 | — | — | US | claimed |
| EP-2146246-A1 | Negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | claimed |
| US-7635553-B2 | Pattern forming method and resist composition used therefor | FUJIFILM CORPORATION (JP) | 2009-12-22 | — | — | US | claimed |
| US-6794108-B1 | COMPOUND CAPABLE OF GENERATING ACID BY ACTINIC RADIATION; POLYMER AND COMPOUND THAT DECOMPOSE TO A SULFONIC ACID; STORAGE STABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 2004-09-21 | — | — | US | claimed |
| CN-1262317-A | Ether ester type dry cleaning solvent composition | LI JINYAN (CN) | 2000-08-09 | — | — | CN | claimed |
| CN-113412533-B | Spin-on composition comprising an inorganic oxide component and an alkynyloxy-substituted spin-on carbon component | 默克专利股份有限公司 | 2026-05-22 | — | — | CN | disclosed |
| CN-122028714-A | Method for manufacturing semiconductor device and composition for coating patterned photoresist | 台湾积体电路制造股份有限公司 | 2026-05-12 | — | — | CN | disclosed |
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-07 | — | — | US | disclosed |
| CN-1262317-A | Ether ester type dry cleaning solvent composition | LI JINYAN (CN) | 2000-08-09 | — | — | CN | disclosed |
| US-5908720-A | CARBON BLACK COATED WITH A RESIN OBTAINED FROM ONE OR MORE POLYMERIZABLE MONOMERS HAVING AT LEAST ONE REACTIVE GROUP SELECTED FROM THE GROUP CONSISTING OF EPOXY, THIOEPOXY, OXAZOLINE, AZILIDINE AND HYDROXYALKYL AMIDE GROUPS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-06-01 | — | — | US | disclosed |
| US-5239111-A | Catalytic esterification of propylene glycol monomethyl ether with propionic acid | SHINY CHEMICAL INDUSTRIAL CO., LTD. (TW) | 1993-08-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | C9, C1S, ZKSCAN2 | MGAM 2571/4885GAA 1447/4885SI 736/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.