Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Propylene Glycol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | DGKA | P23743 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylene Glycol SCHEMBL28409524 | 0.93 | NAAA (0.50) | NAAAHSD17B10TDP1MAPTALDH1A1 | |
| Propylene Glycol SCHEMBL21569410 | 0.91 | NAAA (0.38) | NAAAHSD17B10MAPTALDH1A1 | |
| Propylene Glycol SCHEMBL443947 | 0.90 | NAAA (0.55) | NAAAMAPTALDH1A1TSHRKDM4E | |
| Ethyl Propionate SCHEMBL104601 | 0.87 | MGAM (0.43) | NAAAHSD17B10TDP1MAPTALDH1A1 | |
| Propylene Glycol SCHEMBL8961545 | 0.87 | NAAA (0.66) | NAAAMAPTKDM4EDUSP3MEN1 | |
| Ether SCHEMBL5414917 | 0.85 | NAAA (0.50) | NAAAALDH1A1TSHRKDM4ELMNA | |
| Ether SCHEMBL11290290 | 0.84 | TDP1 (0.50) | NAAAHSD17B10TDP1MAPTKDM4E | |
| Acetic Acid Propyl Ester SCHEMBL105186 | 0.84 | ALDH1A1 (0.53) | HSD17B10TDP1MAPTALDH1A1TSHR | |
| Di(Hydroxyethyl)Ether SCHEMBL5406756 | 0.81 | ALDH1A1 (0.48) | NAAAMAPTALDH1A1TSHRMEN1 | |
| Propylene Glycol SCHEMBL5144291 | 0.81 | NAAA (0.62) | NAAAMAPTALDH1A1TSHRKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 298 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113260922-B | Positive photosensitive resin composition | 株式会社东进世美肯 | 2025-02-25 | — | — | CN | claimed |
| CN-110967927-B | Photosensitive resin composition and display device including the same | 三星显示有限公司 | 2025-01-28 | — | — | CN | claimed |
| CN-108572516-B | Positive photosensitive resin composition, display device and pattern forming method thereof | 株式会社东进世美肯 | 2023-10-17 | — | — | CN | claimed |
| CN-116648671-A | Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index | 株式会社东进世美肯 | 2023-08-25 | — | — | CN | claimed |
| CN-114556216-A | Positive photosensitive resin composition and display element using the same | 株式会社东进世美肯 | 2022-05-27 | — | — | CN | claimed |
| CN-113260922-A | Positive photosensitive resin composition | 株式会社东进世美肯 | 2021-08-13 | — | — | CN | claimed |
| US-10982061-B2 | Photosensitive resin composition and display device including the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2021-04-20 | — | — | US | claimed |
| CN-105759568-B | Positive photosensitive siloxane resin composition and display device formed using the same | 三星显示有限公司 | 2021-03-19 | — | — | CN | claimed |
| CN-111123644-A | Photosensitive resin composition, display, and method for forming pattern of display | 株式会社东进世美肯 | 2020-05-08 | — | — | CN | claimed |
| CN-110967927-A | Photosensitive resin composition and display device including the same | 三星显示有限公司 | 2020-04-07 | — | — | CN | claimed |
| US-20200102433-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE INCLUDING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2020-04-02 | — | — | US | claimed |
| US-8492459-B2 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2013-07-23 | — | — | US | claimed |
| US-20090176936-A1 | Ink composition and method of forming a pattern using the same | LG DISPLAY CO., LTD. (KR) | 2009-07-09 | — | — | US | claimed |
| US-6794108-B1 | COMPOUND CAPABLE OF GENERATING ACID BY ACTINIC RADIATION; POLYMER AND COMPOUND THAT DECOMPOSE TO A SULFONIC ACID; STORAGE STABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 2004-09-21 | — | — | US | claimed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| US-20260098188-A1 | RELEASE AGENT COMPOSITION FOR LIGHT IRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR LIGHT IRRADIATION RELEASE | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-09 | — | — | US | disclosed |
| EP-4692942-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-1150165-A1 | Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element | JSR Corporation (JP) | 2001-10-31 | — | — | EP | disclosed |
| EP-1057859-A2 | Radiation sensitive resin composition and use of the same in an interlaminar insulating film | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-0952489-A1 | Positive photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260098188-A1 | RELEASE AGENT COMPOSITION FOR LIGHT IRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR LIGHT IRRADIATION RELEASE | ERCC1, SMC2, SMC3 | NAAA 3756/4885HSD17B10 2662/4885TDP1 1810/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.