Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 3/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | TFEB | P19484 | 1/20 | 0.36 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 3/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | SRC | P12931 | 1/20 | 0.33 |
| ▸ | BRD4 | O60885 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6512118 | 0.93 | MAPT (0.40) | ELANEHPGDKDM4ENFE2L2HSD17B10 | |
| SCHEMBL1913791 | 0.87 | PTGDR2 (0.47) | ELANEHPGDKDM4ENFE2L2HSD17B10 | |
| SCHEMBL7711834 | 0.85 | ELANE (0.39) | ELANENFE2L2ATMKMT2ABRD4 | |
| SCHEMBL9777100 | 0.85 | FBP1 (0.36) | ELANEHPGDKDM4ENFE2L2HSD17B10 | |
| SCHEMBL6393965 | 0.85 | ALDH1A1 (0.39) | ELANEHPGDKDM4ENFE2L2HSD17B10 | |
| SCHEMBL9499670 | 0.84 | HSD17B10 (0.42) | ELANEHPGDKDM4ENFE2L2HSD17B10 | |
| SCHEMBL2791736 | 0.84 | PTGDR2 (0.42) | HPGDKDM4ENFE2L2HSD17B10TFEB | |
| SCHEMBL6564756 | 0.82 | ELANE (0.39) | ELANEHPGDKDM4ESMN1; SMN2KMT2A | |
| SCHEMBL10709794 | 0.82 | ELANE (0.36) | ELANEHPGDKDM4ENFE2L2HSD17B10 | |
| SCHEMBL7542596 | 0.81 | KDM4E (0.54) | HPGDKDM4ENFE2L2HSD17B10TFEB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1040 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12535738-B2 | Photoresist top coating material for etching rate control | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-01-27 | — | — | US | claimed |
| EP-1944775-B1 | Production of electronic devices | FLEXENABLE LTD (GB) | 2017-10-25 | — | — | EP | claimed |
| US-7718235-B2 | Overcoat composition for image recording materials | EASTMAN KODAK COMPANY (US) | 2010-05-18 | — | — | US | claimed |
| EP-2166543-A1 | Production of electronic devices | Plastic Logic Limited (GB) | 2010-03-24 | — | — | EP | claimed |
| EP-1465877-B1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA (US) | 2008-09-24 | — | — | EP | claimed |
| EP-1944775-A1 | Production of electronic devices | Plastic Logic Limited (GB) | 2008-07-16 | — | — | EP | claimed |
| US-20070141278-A1 | OVERCOAT COMPOSITION FOR IMAGE RECORDING MATERIALS | BANK OF AMERICA, N.A., AS AGENT | 2007-06-21 | — | — | US | claimed |
| US-20070122744-A1 | Positive-working photoresist composition and photosensitive material using same | MAEMORI SATOSHI | 2007-05-31 | — | — | US | claimed |
| US-7219989-B2 | Overcoat composition for image recording materials | EASTMAN KODAK COMPANY (US) | 2007-05-22 | — | — | US | claimed |
| US-20070012950-A1 | Production of electronic devices | FLEXENABLE LIMITED (GB) | 2007-01-18 | — | — | US | claimed |
| WO-1994011788-A1 | METHOD OF PRODUCING MICROSTRUCTURES | TECHNISCHE UNIVERSITEIT DELFT (NL) | 1994-05-26 | — | — | WO | claimed |
| US-5250395-A | Coating substrate with film of blocked polymer and aromatic dye, exposing to electromagnetic radiation, contacting with organometallic compound to form etch barrier, etching with reactive ions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1993-10-05 | — | — | US | claimed |
| EP-0546703-A1 | Lithographic material and processes involved in their use | AT&T Corp. (US) | 1993-06-16 | — | — | EP | claimed |
| EP-0540032-A1 | Photoresist composition and etching method | FUJI PHOTO FILM CO., LTD. (JP) | 1993-05-05 | — | — | EP | claimed |
| EP-0102450-B1 | RESIST COMPOSITIONS | International Business Machines Corporation (US) | 1991-09-04 | — | — | EP | claimed |
| EP-0282724-B1 | NEGATIVE RESIST COMPOSITIONS | International Business Machines Corporation (US) | 1990-12-12 | — | — | EP | claimed |
| US-4908298-A | Method of creating patterned multilayer films for use in production of semiconductor circuits and systems | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1990-03-13 | — | — | US | claimed |
| EP-0282724-A1 | Negative resist compositions | International Business Machines Corporation (US) | 1988-09-21 | — | — | EP | claimed |
| US-4491628-A | TERT-BUTYL ESTERS OR CARBONATES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1985-01-01 | — | — | US | claimed |
| EP-0102450-A2 | Resist compositions | International Business Machines Corporation (US) | 1984-03-14 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12535738-B2 | Photoresist top coating material for etching rate control | ALKBH2, TOP2A, KDM2A | ELANE 2342/4885HPGD 4001/4885KDM4E 16/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.