SCHEMBL7542596

SCHEMBL7542596

C=Cc1ccccc1OC(=O)OC

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.54
HPGD P15428 2/20 0.54
HSD17B10 Q99714 1/20 0.54
NFE2L2 Q16236 4/20 0.44
TFEB P19484 1/20 0.42
KMT2A Q03164 2/20 0.41
ALDH1A1 P00352 2/20 0.41
MEN1 O00255 1/20 0.41
CYP3A4 P08684 1/20 0.41
NPC1 O15118 2/20 0.40
SLC6A3 Q01959 1/20 0.40
MAPT P10636 3/20 0.40
JAK2 O60674 1/20 0.40
GAA P10253 1/20 0.40
HTT P42858 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
LMNA P02545 2/20 0.39
BCHE P06276 1/20 0.38
RAB9A P51151 1/20 0.38
PTGDR2 Q9Y5Y4 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2791736 0.89 PTGDR2 (0.42) KDM4EHPGDHSD17B10NFE2L2TFEB
SCHEMBL1665178 0.85 HPGD (0.58) KDM4EHPGDHSD17B10NFE2L2TFEB
SCHEMBL8901347 0.85 KDM4E (0.58) KDM4EHPGDHSD17B10NFE2L2TFEB
SCHEMBL7537122 0.85 KDM4E (0.39) KDM4EHPGDHSD17B10NFE2L2TFEB
SCHEMBL9127868 0.82 KDM4E (0.37) KDM4EHPGDHSD17B10NFE2L2TFEB
SCHEMBL30706195 0.81 PTGS2 (0.52) KDM4EHPGDHSD17B10KMT2AALDH1A1
SCHEMBL58004 0.81 PTGS2 (0.52) KDM4EHPGDHSD17B10KMT2AALDH1A1
SCHEMBL17417576 0.81 PTGDR2 (0.41) KDM4EHPGDHSD17B10NFE2L2TFEB
SCHEMBL104808 0.81 ELANE (0.42) KDM4EHPGDHSD17B10NFE2L2TFEB
SCHEMBL7541864 0.81 LMNA (0.47) KDM4EHPGDNFE2L2KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020015906-A1 Polymer for photoresist, method of production thereof and photoresist composition containing polymer SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-02-07 US disclosed