SCHEMBL10491968

SCHEMBL10491968

CCCCCCCCCCCCCCCCCC1=NC(CC)(CO)CO1

nearest known ligand 0.38

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 6/20 0.35
LMNA P02545 1/20 0.34
SIRT2 Q8IXJ6 1/20 0.31
THRA P10827 1/20 0.31
THRB P10828 1/20 0.31
GAA P10253 1/20 0.30
SCD O00767 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10492039 1.00 PRKCA (0.35) PRKCALMNASIRT2THRATHRB
SCHEMBL6682873 1.00 PRKCA (0.35) PRKCALMNASIRT2THRATHRB
SCHEMBL676710 1.00 PRKCA (0.35) PRKCALMNASIRT2THRATHRB
SCHEMBL9617221 0.93 LMNA (0.39) PRKCALMNASIRT2THRATHRB
SCHEMBL16504781 0.93 LMNA (0.39) PRKCALMNASIRT2THRATHRB
SCHEMBL11883705 0.93 LMNA (0.39) PRKCALMNASIRT2THRATHRB
SCHEMBL9404086 0.93 LMNA (0.39) PRKCALMNASIRT2THRATHRB
SCHEMBL10957671 0.92 LMNA (0.40) PRKCALMNAGAA
SCHEMBL322644 0.92 EPHX2 (0.38) PRKCA
SCHEMBL16666208 0.92 EPHX2 (0.38) PRKCA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1326199-C Polishing composition comprising inhibitor of tungsten erosion CABOT CORP (US) 2007-07-11 CN claimed
CN-102344760-B Chemically mechanical polishing agent ANJI MICROELECTRONICS CO LTD 2014-12-03 CN disclosed
CN-102373012-B Chemical-mechanical polishing solution ANJI MICROELECTRONICS CO LTD 2014-11-05 CN disclosed
CN-103360953-A Chemico-mechanical polishing liquid ANJI MICROELECTRONICS TECHNOLOGY SHANGHAI CO LTD 2013-10-23 CN disclosed
CN-102373012-A Chemical-mechanical polishing solution ANJI MICROELECTRONICS CO LTD 2012-03-14 CN disclosed
CN-102344760-A Chemically mechanical polishing agent ANJI MICROELECTRONICS CO LTD 2012-02-08 CN disclosed
US-4876249-A TOPICAL; TRANSDERMAL, SYSTEMIC; FLUOCINOLINE ACETONIDE AND IMIDAZOLINE OR OXAZOLINE PENETRATION ENHANCER MIXTURE; THERAPEUTIC DRUGS THERAPEUTIC PATCH RESEARCH N.V. 1989-10-24 US disclosed
US-4095940-A Process for the production of camouflage dyeings and prints HOECHST AKTIENGESELLSCHAFT (DT) 1978-06-20 US disclosed
US-4082502-A PROCESS FOR THE DYEING OF SYNTHETIC OR NATURAL FIBERS HOECHST AKTIENGESELLSCHAFT (DT) 1978-04-04 US disclosed
US-3967015-A COATING OF THERMOSETTING EPOXY RESIN AND AN OXAZOLINE COMMERCIAL SOLVENTS CORPORATION (US) 1976-06-29 US disclosed