SCHEMBL1058052

SCHEMBL1058052

Cc1ccccc1N(C(=S)S)c1ccccc1C

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.38
ACHE P22303 1/20 0.38
SIGMAR1 Q99720 1/20 0.37
LMNA P02545 2/20 0.36
CYP3A4 P08684 2/20 0.35
TRPM8 Q7Z2W7 1/20 0.35
ALDH1A1 P00352 3/20 0.33
TP53 P04637 2/20 0.33
MAPT P10636 2/20 0.33
HSD17B1 P14061 1/20 0.33
HSD17B2 P37059 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
POLB P06746 1/20 0.33
GAA P10253 1/20 0.33
KDM4E B2RXH2 1/20 0.32
HPGD P15428 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
GPR55 Q9Y2T6 1/20 0.32
SLC6A2 P23975 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14354423 0.88 ALDH1A1 (0.44) TSHRSIGMAR1LMNATRPM8ALDH1A1
SCHEMBL1059500 0.81 SIGMAR1 (0.47) TSHRACHESIGMAR1ALDH1A1HSD17B1
SCHEMBL9870757 0.80 LMNA (0.41) TSHRACHESIGMAR1LMNACYP3A4
SCHEMBL141725 0.78 ALDH1A1 (0.50) TSHRACHESIGMAR1LMNACYP3A4
SCHEMBL30716542 0.78 ALDH1A1 (0.50) TSHRACHESIGMAR1LMNACYP3A4
Thiourea SCHEMBL28193664 0.78 SIGMAR1 (0.41) TSHRACHESIGMAR1LMNACYP3A4
Zinc Ion SCHEMBL941335 0.77 CA12 (0.39) TSHRACHESIGMAR1LMNACYP3A4
SCHEMBL9355683 0.77 CA12 (0.44) TSHRACHESIGMAR1LMNACYP3A4
Lithium Ion SCHEMBL9355801 0.77 CA12 (0.39) TSHRACHESIGMAR1LMNACYP3A4
SCHEMBL16628430 0.77 CA12 (0.39) TSHRACHESIGMAR1LMNACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2500088-A2 Molecular recognition material and production method thereof Shiseido Co., Ltd. (JP) 2012-09-19 EP disclosed
US-20110021347-A1 Molecule Recognizing Material And Process For Producing The Molecule Recognizing Material KEIO UNIVERSITY (JP) 2011-01-27 US disclosed
EP-2198952-A1 MOLECULE RECOGNIZING MATERIAL AND PROCESS FOR PRODUCING THE MOLECULE RECOGNIZING MATERIAL Keio University (JP) 2010-06-23 EP disclosed