SCHEMBL10599472

SCHEMBL10599472

CC(C)(C)c1ccc(SCCSc2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.57
NPC1 O15118 4/20 0.56
RAB9A P51151 4/20 0.56
L3MBTL1 Q9Y468 2/20 0.56
HRH3 Q9Y5N1 2/20 0.54
CYP1A2 P05177 1/20 0.54
CYP3A4 P08684 1/20 0.54
CYP2D6 P10635 1/20 0.54
CYP2C19 P33261 1/20 0.54
HRH4 Q9H3N8 1/20 0.54
SMN1; SMN2 Q16637 2/20 0.52
MAPK1 P28482 2/20 0.46
TSHR P16473 1/20 0.46
LMNA P02545 2/20 0.44
TYR P14679 1/20 0.44
BCHE P06276 2/20 0.39
ACHE P22303 2/20 0.39
TP53 P04637 1/20 0.39
HPGD P15428 1/20 0.39
NFKB1 P19838 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5168465 0.91 ALDH1A1 (0.53) ALDH1A1NPC1RAB9AL3MBTL1HRH3
SCHEMBL25934909 0.88 ALDH1A1 (0.47) ALDH1A1NPC1RAB9AL3MBTL1HRH3
SCHEMBL10684156 0.87 ALDH1A1 (0.55) ALDH1A1NPC1RAB9AL3MBTL1HRH3
SCHEMBL11102011 0.87 ALDH1A1 (0.50) ALDH1A1NPC1RAB9AL3MBTL1HRH3
SCHEMBL11196940 0.87 ALDH1A1 (0.50) ALDH1A1NPC1RAB9AL3MBTL1HRH3
SCHEMBL2161163 0.87 ALDH1A1 (0.55) ALDH1A1NPC1RAB9AL3MBTL1HRH3
SCHEMBL16683596 0.86 ALDH1A1 (0.46) ALDH1A1NPC1RAB9AL3MBTL1HRH3
SCHEMBL7058481 0.85 MAOA (0.50) ALDH1A1NPC1RAB9AL3MBTL1HRH3
SCHEMBL10471246 0.83 ALDH1A1 (0.51) ALDH1A1NPC1RAB9AL3MBTL1HRH3
SCHEMBL16301153 0.83 NPC1 (0.47) ALDH1A1NPC1RAB9AL3MBTL1HRH3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114685331-B Process for producing 1, 2-dithioethane compound 华南理工大学 2024-07-09 CN disclosed
CN-114685331-A Process for producing 1, 2-dithioethane compound 华南理工大学 2022-07-01 CN disclosed
US-4833121-A Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1989-05-23 US disclosed