Sugi Predict

Sugi Predict / Compounds / SCHEMBL7058481

SCHEMBL7058481

SCHEMBL7058481

CCCCSc1ccc(C(C)(C)C)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAOA P21397 1/20 0.50
▸ MAOB P27338 1/20 0.50
▸ NPC1 O15118 2/20 0.49
▸ RAB9A P51151 2/20 0.49
▸ ALDH1A1 P00352 2/20 0.49
▸ L3MBTL1 Q9Y468 1/20 0.49
▸ CYP1A2 P05177 1/20 0.47
▸ CYP3A4 P08684 1/20 0.47
▸ CYP2D6 P10635 1/20 0.47
▸ CYP2C19 P33261 1/20 0.47
▸ HRH4 Q9H3N8 1/20 0.47
▸ HRH3 Q9Y5N1 1/20 0.47
▸ SMN1; SMN2 Q16637 1/20 0.45
▸ AR P10275 2/20 0.43
▸ SLC2A1 P11166 1/20 0.42
▸ HDAC3 O15379 2/20 0.40
▸ HDAC1 Q13547 2/20 0.40
▸ HDAC2 Q92769 2/20 0.40
▸ HDAC8 Q9BY41 1/20 0.40
▸ HDAC6 Q9UBN7 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyanide SCHEMBL28096799 0.94 MAOA (0.46) MAOAMAOBNPC1RAB9AALDH1A1
SCHEMBL16301153 0.94 NPC1 (0.47) MAOAMAOBNPC1RAB9AALDH1A1
SCHEMBL15086078 0.92 THRA (0.47) MAOAMAOBNPC1RAB9AALDH1A1
SCHEMBL5168465 0.90 ALDH1A1 (0.53) MAOAMAOBNPC1RAB9AALDH1A1
SCHEMBL25557817 0.89 SLC2A1 (0.49) MAOAMAOBNPC1RAB9AALDH1A1
SCHEMBL10599472 0.85 ALDH1A1 (0.57) NPC1RAB9AALDH1A1L3MBTL1CYP1A2
SCHEMBL5887468 0.85 MAOA (0.62) MAOAMAOBNPC1RAB9AALDH1A1
SCHEMBL9344482 0.85 MAOA (0.47) MAOAMAOBNPC1RAB9AALDH1A1
SCHEMBL5825886 0.82 ALDH1A1 (0.51) NPC1RAB9AALDH1A1L3MBTL1CYP1A2
SCHEMBL10471246 0.82 ALDH1A1 (0.51) NPC1RAB9AALDH1A1L3MBTL1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113126432-A Coating composition for photoresist underlayer 罗门哈斯电子材料韩国有限公司 2021-07-16 — — CN disclosed
CN-108139673-B Metal oxide containing materials, methods of making and methods of using the same 默克专利有限公司 2021-06-15 — — CN disclosed
CN-105319839-B Gap filling method 罗门哈斯电子材料有限责任公司 2020-11-10 — — CN disclosed
WO-2020129683-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2020-06-25 — — WO disclosed
US-10633362-B2 Benzothiophene estrogen receptor modulators G1 THERAPEUTICS, INC. (US) 2020-04-28 — — US disclosed
EP-2539316-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2019-10-23 — — EP disclosed
US-20190119243-A1 BENZOTHIOPHENE ESTROGEN RECEPTOR MODULATORS G1 THERAPEUTICS, INC. (US) 2019-04-25 — — US disclosed
CN-108139673-A Material, preparation method and its application method comprising metal oxide AZ电子材料卢森堡有限公司 2018-06-08 — — CN disclosed
CN-105304550-B Gap filling method 罗门哈斯电子材料有限公司 2018-05-08 — — CN disclosed
US-9405197-B2 Pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2016-08-02 — — US disclosed
US-20150111135-A1 PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD FUJIFILM CORPORATION (JP) 2015-04-23 — — US disclosed
US-8999622-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2015-04-07 — — US disclosed
US-8940476-B2 Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film FUJIFILM CORPORATION (JP) 2015-01-27 — — US disclosed
WO-2014119698-A1 PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-07 — — WO disclosed
US-20140205947-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2014-07-24 — — US disclosed
US-20130115556-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2013-05-09 — — US disclosed
US-6652930-B2 Comprises mixture of compounds such as 1,2-bis(2-hydroxyethyl thio)ethane and homo/copolymers of diallylamine compounds such as polydiallylamine hydrochloride; phthalocyanine dye adds to stability; discoloration inhibition extends shelf-life OJI PAPER CO., LTD. (JP) 2003-11-25 — — US disclosed
US-20030134227-A1 Cyclic sulfonium and sulfoxonium photoacid generators and photoresists comprising same SHIPLEY COMPANY, LLC 2003-07-17 — — US disclosed
EP-1308781-A2 Cyclic sulfonium and sulfoxonium photoacid generators and photoresists containing them Shipley Co. L.L.C. (US) 2003-05-07 — — EP disclosed
US-20020071941-A1 Sheet for ink jet-recording OJI PAPER CO., LTD. (JP) 2002-06-13 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10633362-B2 Benzothiophene estrogen receptor modulators ESR1, GPER1, ESR2 MAOA 2724/4885MAOB 2656/4885NPC1 1083/4885
US-20190119243-A1 BENZOTHIOPHENE ESTROGEN RECEPTOR MODULATORS ESR1, GPER1, ESR2 MAOA 2724/4885MAOB 2656/4885NPC1 1083/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.