SCHEMBL10604973

SCHEMBL10604973

CC(=O)OCc1ccc(Cc2ccc(COC(C)=O)cc2)cc1

nearest known ligand 0.69

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.69
CYP3A4 P08684 1/20 0.53
KMT2A Q03164 3/20 0.52
IDH1 O75874 1/20 0.47
LMNA P02545 1/20 0.45
MEN1 O00255 1/20 0.45
ESR1 P03372 1/20 0.44
ESR2 Q92731 1/20 0.44
CA2 P00918 1/20 0.43
ELANE P08246 1/20 0.42
CFD P00746 1/20 0.42
MAPK1 P28482 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
SLC6A2 P23975 1/20 0.41
SLC6A3 Q01959 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
POLB P06746 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11315920 1.00 ALDH1A1 (0.69) ALDH1A1CYP3A4KMT2AIDH1LMNA
SCHEMBL132773 0.93 ALDH1A1 (0.78) ALDH1A1CYP3A4KMT2AIDH1LMNA
SCHEMBL4198688 0.86 ALDH1A1 (0.69) ALDH1A1CYP3A4KMT2AIDH1MEN1
SCHEMBL126492 0.86 ALDH1A1 (0.69) ALDH1A1CYP3A4KMT2ALMNAMEN1
SCHEMBL7669070 0.84 ALDH1A1 (0.67) ALDH1A1CYP3A4KMT2AIDH1MEN1
SCHEMBL873414 0.84 ALDH1A1 (0.67) ALDH1A1CYP3A4LMNACA2
SCHEMBL3225684 0.84 ALDH1A1 (0.67) ALDH1A1CYP3A4KMT2AIDH1MEN1
SCHEMBL7184720 0.84 ALDH1A1 (0.67) ALDH1A1CYP3A4KMT2AIDH1LMNA
SCHEMBL10017478 0.84 ALDH1A1 (0.67) ALDH1A1CYP3A4KMT2ALMNAMEN1
P-Xylene SCHEMBL9685877 0.84 ALDH1A1 (0.67) ALDH1A1CYP3A4LMNACA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0212482-B1 PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS HOECHST CELANESE CORPORATION (US) 1989-04-19 EP disclosed
EP-0106156-B1 LIGHT-SENSITIVE COMPOSITION HOECHST CELANESE CORPORATION (US) 1988-12-21 EP disclosed
EP-0212482-A2 Process for obtaining negative images from positive photoresists HOECHST CELANESE CORPORATION (US) 1987-03-04 EP disclosed
EP-0061150-B1 LIGHT-SENSITIVE POLYCONDENSATION PRODUCT, PROCESS FOR ITS PREPARATION AND LIGHT-SENSITIVE RECORDING MATERIAL CONTAINING THE SAME AMERICAN HOECHST CORPORATION (US) 1986-10-15 EP disclosed
EP-0106156-A2 Light-sensitive composition HOECHST CELANESE CORPORATION (US) 1984-04-25 EP disclosed
EP-0061150-A1 Light-sensitive polycondensation product, process for its preparation and light-sensitive recording material containing the same AMERICAN HOECHST CORPORATION (US) 1982-09-29 EP disclosed