SCHEMBL1060924

SCHEMBL1060924

Brc1cc(Br)c(-c2nc(-c3ccccc3)c(-c3ccccc3)n2C2(c3c(Br)cc(Br)cc3Br)N=C(c3ccccc3)C(c3ccccc3)=N2)c(Br)c1

nearest known ligand 0.36

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
MGAM O43451 3/20 0.36
GAA P10253 3/20 0.36
SI P14410 3/20 0.36
MGAM2 Q2M2H8 3/20 0.36
AKT2 P31751 5/20 0.32
AKT1 P31749 4/20 0.32
NQO2 P16083 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1871114 0.85 AKT1 (0.33) AKT2AKT1
SCHEMBL1869448 0.82 AKT1 (0.36) MGAMGAASIMGAM2AKT2
SCHEMBL1060659 0.80 AKT1 (0.41) AKT2AKT1
SCHEMBL16746558 0.78 AKT1 (0.36) GAAAKT2AKT1
SCHEMBL1864926 0.78 AKT1 (0.35) MGAMGAASIMGAM2AKT2
SCHEMBL1868436 0.78 FABP4 (0.33) MGAMGAASIMGAM2AKT2
SCHEMBL476551 0.78 GAA (0.38) MGAMGAASIMGAM2AKT2
SCHEMBL3172557 0.77 AKT1 (0.38) MGAMGAASIMGAM2AKT2
SCHEMBL29392749 0.76 MGAM (0.34) MGAMGAASIMGAM2AKT2
SCHEMBL476661 0.76 MGAM (0.34) MGAMGAASIMGAM2AKT2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 180 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US claimed
US-6087050-A Radiation sensitive composition and color filter JSR CORPORATION (JP) 2000-07-11 US claimed
EP-0902327-A2 Radiation sensitive composition JSR Corporation (JP) 1999-03-17 EP claimed
EP-0881541-A1 Radiation sensitive composition and color filter JSR Corporation (JP) 1998-12-02 EP claimed
EP-0875788-A1 Radiation sensitive composition for color filters JSR Corporation (JP) 1998-11-04 EP claimed
US-20240206322-A1 OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC DEVICE KANEKA CORPORATION (JP) 2024-06-20 US disclosed
EP-4223746-A1 POLYMERIZABLE COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, AND OPTICALLY ANISOTROPIC MATERIAL Zeon Corporation (JP) 2023-08-09 EP disclosed
EP-3483141-B1 POLYMERIZABLE COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, AND OPTICALLY ANISOTROPIC MATERIAL ZEON CORP (JP) 2023-07-19 EP disclosed
US-20230002562-A1 POLYSILOXANE COPOLYMER, METHOD FOR PREPARING THE SAME AND RESIN COMPOSITION INCLUDING THE SAME HUNETPLUS CO., LTD. (KR) 2023-01-05 US disclosed
WO-2022210798-A1 OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC APPARATUS 株式会社カネカ 2022-10-06 WO disclosed
WO-2022196987-A1 ADHESIVE COMPOSITION, AND ADHESIVE SHEET, OPTICAL MEMBER, AND DISPLAY APPARATUS PRODUCED USING SAME 동우 화인켐 주식회사 2022-09-22 WO disclosed
WO-2022186641-A1 ADHESIVE COMPOSITION, ADHESIVE SHEET PREPARED BY USING SAME, OPTICAL MEMBER, AND DISPLAY DEVICE 동우 화인켐 주식회사 2022-09-09 WO disclosed
EP-1033626-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
US-6087050-A Radiation sensitive composition and color filter JSR CORPORATION (JP) 2000-07-11 US disclosed
US-6013415-A Radiation sensitive composition JSR CORPORATION (JP) 2000-01-11 US disclosed
EP-0902327-A2 Radiation sensitive composition JSR Corporation (JP) 1999-03-17 EP disclosed
EP-0893737-A2 Radiation sensitive composition JSR Corporation (JP) 1999-01-27 EP disclosed
EP-0881541-A1 Radiation sensitive composition and color filter JSR Corporation (JP) 1998-12-02 EP disclosed
EP-0875788-A1 Radiation sensitive composition for color filters JSR Corporation (JP) 1998-11-04 EP disclosed
EP-0866367-A2 Radiation sensitive composition JSR Corporation (JP) 1998-09-23 EP disclosed