SCHEMBL106515

SCHEMBL106515

C[SiH](C)OCCc1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA9 Q16790 1/20 0.44
IDO1 P14902 1/20 0.43
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
ALDH1A1 P00352 1/20 0.42
HPGD P15428 1/20 0.42
ALOX15 P16050 1/20 0.42
ALOX12 P18054 1/20 0.42
CASP1 P29466 1/20 0.42
HSD17B10 Q99714 1/20 0.42
TAAR1 Q96RJ0 3/20 0.41
ATM Q13315 1/20 0.41
TDP1 Q9NUW8 3/20 0.41
CYP2A6 P11509 1/20 0.41
HTR2A P28223 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
LOXL2 Q9Y4K0 1/20 0.41
HCAR2 Q8TDS4 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL104984 0.87 IDO1 (0.55) IDO1AOC3
SCHEMBL104848 0.85 IDO1 (0.48) IDO1TDP1
SCHEMBL28938432 0.81 CA1 (0.40) CA1CA2CA9IDO1NPC1
SCHEMBL7060070 0.81 CA1 (0.40) CA1CA2CA9IDO1NPC1
SCHEMBL10704783 0.81 CA1 (0.40) CA1CA2CA9IDO1NPC1
SCHEMBL19809414 0.79 CA1 (0.39) CA1CA2CA9IDO1NPC1
SCHEMBL704244 0.78 TDP1 (0.43) CA1CA2CA9IDO1NPC1
SCHEMBL28519614 0.78 TRPA1 (0.36) ALDH1A1
SCHEMBL3815491 0.78 CA1 (0.41) CA1CA2CA9IDO1NPC1
SCHEMBL28507218 0.78 CA1 (0.32) CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 285 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119431794-A Organosilicon tackifier and preparation method and application thereof 杭州之江有机硅化工有限公司 2025-02-14 CN claimed
CN-119100394-A Method for preparing high-purity nano silicon carbide powder by combining microwave heating technology with self-suspension carbothermal reduction technology 绍兴晶彩科技有限公司 2024-12-10 CN claimed
CN-117654475-A Macroporous alumina forming carrier, selective hydrogenation catalyst, preparation method and application thereof 中国石油化工股份有限公司 2024-03-08 CN claimed
CN-117327281-A Core-shell type organic silicon resin and ink prepared from same for packaging flexible OLED display thin film 江苏广信感光新材料股份有限公司 2024-01-02 CN claimed
CN-115181223-B Low-gloss matte auxiliary agent, preparation method thereof and molded body 铨盛聚碳科技股份有限公司 2023-08-29 CN claimed
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN claimed
CN-114456385-A Preparation method of MDT (methyl phenyl silicone oil) for cosmetics 湖南科技学院 2022-05-10 CN claimed
EP-2628744-B1 Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process SHINETSU CHEMICAL CO (JP) 2016-11-30 EP claimed
EP-2628745-B1 Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process SHINETSU CHEMICAL CO (JP) 2015-03-25 EP claimed
US-20120071700-A1 CATALYSTS FOR HYDROGENATION OF UNSATURATED HYDROCARBONS AND PREPARATIONS AND USES THEREOF CHINA PETROLEUM & CHEMICAL CORPORATION (CN) 2012-03-22 US claimed
EP-0278157-B1 A RUBBER COMPOSITION Shin-Etsu Chemical Co., Ltd. (JP) 1993-06-16 EP claimed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
US-20260103392-A1 CRYSTALLINE TITANIUM OXIDE CORE-SHELL PARTICLES AND DISPERSION CONTAINING SAME JGC CATALYSTS AND CHEMICALS LTD. (JP) 2026-04-16 US disclosed
EP-4696404-A1 SEPARATION MEMBRANE AND METHOD FOR PRODUCING SAME Hiroshima University (JP) 2026-02-18 EP disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-1375597-A1 RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND UTILIZATION THEREOF JSR Corporation (JP) 2004-01-02 EP disclosed
US-20030211407-A1 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same FUJITSU LIMITED (JP) 2003-11-13 US disclosed
US-20030171468-A1 Radiation-sensitive composition changing in refractive index and utilization thereof JSR CORPORATION (JP) 2003-09-11 US disclosed
US-20030092854-A1 Resin composition for intermediate layer of three-layer resist SUMITOMO CHEMICAL COMPANY, LIMITED 2003-05-15 US disclosed
EP-0193643-A2 Curable resin composition KABUSHIKI KAISHA TOSHIBA (JP) 1986-09-10 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260103392-A1 CRYSTALLINE TITANIUM OXIDE CORE-SHELL PARTICLES AND DISPERSION CONTAINING SAME STRA6, RAB5IF, CCT4 CA1 1904/4885CA2 3168/4885CA9 633/4885
US-20260118767-A1 REVERSE PATTERNING PROCESS EFNA1, EPHA4, ETV6 CA1 1449/4885CA2 2902/4885CA9 505/4885
US-20120071700-A1 CATALYSTS FOR HYDROGENATION OF UNSATURATED HYDROCARBONS AND PREPARATIONS AND USES THEREOF HRH3, HRH2, HRH1 CA1 911/4885CA2 4221/4885CA9 3132/4885
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SMC1A, SPOUT1, LBR CA1 964/4885CA2 2105/4885CA9 1790/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.