Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Adipic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BBOX1 | O75936 | 10/20 | 0.58 |
| ▸ | CA1 | P00915 | 1/20 | 0.57 |
| ▸ | FFAR3 | O14843 | 2/20 | 0.50 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.50 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.50 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.50 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.50 |
| ▸ | FABP3 | P05413 | 3/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL8438225 | 0.97 | BBOX1 (0.56) | BBOX1CA1FFAR3HDAC3HDAC1 | |
| Adipic Acid SCHEMBL8028995 | 0.97 | BBOX1 (0.56) | BBOX1CA1FFAR3HDAC3HDAC1 | |
| Sebacic Acid SCHEMBL5874500 | 0.97 | BBOX1 (0.56) | BBOX1CA1FFAR3HDAC3HDAC1 | |
| Glutarate SCHEMBL104188 | 0.94 | BBOX1 (0.58) | BBOX1CA1FFAR3HDAC3HDAC1 | |
| Hexanoate SCHEMBL105666 | 0.89 | CA1 (0.68) | BBOX1CA1FABP3 | |
| Adipic Acid SCHEMBL106658 | 0.89 | LMNA (0.55) | BBOX1CA1FABP3 | |
| Tetramethylammonium Ion SCHEMBL23754606 | 0.87 | BBOX1 (0.48) | BBOX1CA1FABP3 | |
| Sebacic Acid SCHEMBL5874508 | 0.87 | TSHR (0.57) | BBOX1FABP3 | |
| Myristic Acid SCHEMBL5154017 | 0.87 | FABP3 (0.67) | BBOX1CA1FABP3 | |
| Heptadecanoic Acid SCHEMBL7549840 | 0.87 | FABP3 (0.67) | BBOX1CA1FABP3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4885115-A | Liquid electrolyte for use in electrolytic capacitor | NIPPON CHEMI-CON CORPORATION (JP) | 1989-12-05 | — | — | US | claimed |
| JP-7196781-A | — | — | None | — | — | JP | disclosed |
| EP-2426558-B1 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | SHINETSU CHEMICAL CO (JP) | 2018-10-24 | — | — | EP | disclosed |
| EP-2500775-B1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHINETSU CHEMICAL CO (JP) | 2018-01-03 | — | — | EP | disclosed |
| US-8951711-B2 | Patterning process and composition for forming silicon-containing film usable therefor | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-10 | — | — | US | disclosed |
| US-20140342289-A1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8852844-B2 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-8835102-B2 | Patterning process and composition for forming silicon-containing film usable therefor | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| EP-2172807-B1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-06-18 | — | — | EP | disclosed |
| EP-2172808-B1 | Metal oxide-containing film-forming composition metal oxide-containing film-formed substrate, and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-06-04 | — | — | EP | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| EP-0688806-B1 | Biodegradable aliphatic polyester, melt-extrusion film thereof, and process for the production thereof | TOKUYAMA CORP (JP) | 1999-12-22 | — | — | EP | disclosed |
| US-5783271-A | POLYLACTONE GARBAGE BAG; WATER VAPOR PERMABILITY, HIGH MOLECULAR WEIGHT | TOKUYAMA CORPORATION (JP) | 1998-07-21 | — | — | US | disclosed |
| US-5750218-A | USING 2-OXETANONE | TOKUYAMA CORPORATION (JP) | 1998-05-12 | — | — | US | disclosed |
| US-5731402-A | Biodegradable aliphatic polyester, melt-extrusion film thereof, and process for the production thereof | TOKUYAMA CORPORATION (JP) | 1998-03-24 | — | — | US | disclosed |
| EP-0688806-A2 | Biodegradable aliphatic polyester, melt-extrusion film thereof, and process for the production thereof | TOKUYAMA CORPORATION (JP) | 1995-12-27 | — | — | EP | disclosed |
| JP-H07196781-A | PRODUCTION OF POLY(2-OXETHANONE) | TOKUYAMA CORP | 1995-08-01 | — | — | JP | disclosed |
| US-4885115-A | Liquid electrolyte for use in electrolytic capacitor | NIPPON CHEMI-CON CORPORATION (JP) | 1989-12-05 | — | — | US | disclosed |
| US-4734821-A | AMMONIUM SALT OF CARBOXYLIC ACID | ASAHI GLASS COMPANY LTD. (JP) | 1988-03-29 | — | — | US | disclosed |
| US-4255553-A | COMPRISING A COMPOUND HAVING AT LEAST TWO EPOXY GROUPS, A POLYESTER OR ACRYLIC RESIN, AND A QUARTERNARY AMMONIUM CARBOXYLATE AS CATALYST | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1981-03-10 | — | — | US | disclosed |