Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.70 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.70 |
| ▸ | GLA | P06280 | 1/20 | 0.70 |
| ▸ | GLS | O94925 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 4/20 | 0.48 |
| ▸ | APAF1 | O14727 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15285079 | 0.80 | POLB (0.49) | ALDH1A1KDM4EGLAGLSLMNA | |
| SCHEMBL11339526 | 0.80 | KDM4E (0.46) | ALDH1A1KDM4EGLAGLSLMNA | |
| SCHEMBL114566 | 0.79 | ALDH1A1 (0.70) | ALDH1A1KDM4EGLAGLSLMNA | |
| SCHEMBL324399 | 0.76 | — | — | |
| SCHEMBL17489160 | 0.75 | GLS (0.75) | ALDH1A1KDM4EGLAGLSLMNA | |
| SCHEMBL16447617 | 0.75 | ALDH1A1 (0.64) | ALDH1A1KDM4EGLAGLSLMNA | |
| SCHEMBL21960861 | 0.74 | ALDH1A1 (0.41) | ALDH1A1KDM4EGLALMNASMN1; SMN2 | |
| SCHEMBL5251027 | 0.74 | LMNA (0.45) | ALDH1A1KDM4EGLALMNAAPAF1 | |
| SCHEMBL10274473 | 0.74 | AURKA (0.41) | ALDH1A1KDM4EGLALMNACYP1A2 | |
| SCHEMBL10274476 | 0.73 | L3MBTL1 (0.43) | ALDH1A1KDM4EGLALMNAPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4359368-A1 | COMBINATION OF A PYRAZOLE AND A THIOPHOSPHORIC TRIAMIDE | WockLab GmbH & Co. KG (DE) | 2024-05-01 | — | — | EP | claimed |
| WO-2022268777-A1 | COMBINATION OF A PYRAZOLE AND A THIOPHOSPHORIC TRIAMIDE | WOCKLAB GMBH & CO. KG (DE) | 2022-12-29 | — | — | WO | claimed |
| US-4662905-A | REACTION PRODUCT OF COPPER SALT AND AN IMIDAZOLE, PYRAZOLE, TRIAZOLE, OR TETRAZOLE | Itaru Todoriki, Director of Agency of Industrial Science and Technology (JP) | 1987-05-05 | — | — | US | claimed |
| US-12630742-B2 | Polishing composition using polishing particles containing basic substance and having high water affinity | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-19 | — | — | US | disclosed |
| US-20260117105-A1 | POLISHING COMPOSITION HAVING EXCELLENT STORAGE STABILITY AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12441823-B2 | Resin composition for optical shaping | KURARAY NORITAKE DENTAL INC. (JP) | 2025-10-14 | — | — | US | disclosed |
| EP-3858926-B1 | CURABLE COMPOSITION FOR INKJET, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | SEKISUI CHEMICAL CO LTD (JP) | 2025-08-13 | — | — | EP | disclosed |
| WO-2025126917-A1 | DENTAL COMPOSITION | クラレノリタケデンタル株式会社 | 2025-06-19 | — | — | WO | disclosed |
| US-20250136843-A1 | POLISHING COMPOSITION COMPRISING POLISHING PARTICLES HAVING HIGH WATER AFFINITY | NISSAN CHEMICAL CORPORATION (JP) | 2025-05-01 | — | — | US | disclosed |
| WO-2025069272-A1 | POLISHING COMPOSITION HAVING EXCELLENT STORAGE STABILITY AND METHOD FOR PRODUCING SAME | 日産化学株式会社 | 2025-04-03 | — | — | WO | disclosed |
| WO-2025070705-A1 | POLISHING COMPOSITION HAVING EXCELLENT STORAGE STABILITY AND METHOD FOR PRODUCING SAME | 日産化学株式会社 | 2025-04-03 | — | — | WO | disclosed |
| CN-109743878-A | Suspension and grinding method | 日立化成株式会社 | 2019-05-10 | — | — | CN | disclosed |
| US-10283373-B2 | CMP polishing liquid and polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2019-05-07 | — | — | US | disclosed |
| US-10259773-B2 | Curable composition for inkjet, and method for manufacturing electronic component | SEKISUI CHEMICAL CO., LTD. (JP) | 2019-04-16 | — | — | US | disclosed |
| US-20180043497-A1 | Polishing Agent, Stock Solution for Polishing Agent, and Polishing Method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2018-02-15 | — | — | US | disclosed |
| US-20170298005-A1 | CURABLE COMPOSITION FOR INKJET, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | SEKISUI CHEMICAL CO., LTD. (JP) | 2017-10-19 | — | — | US | disclosed |
| EP-3214142-A1 | CURABLE COMPOSITION FOR INKJET, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | Sekisui Chemical Co., Ltd. (JP) | 2017-09-06 | — | — | EP | disclosed |
| US-20170154787-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2017-06-01 | — | — | US | disclosed |
| CN-104458991-A | Detection method for volatile flavor substance of edible vegetable oil | SERICULTURE & AGRI FOOD RES INST GAAS | 2015-03-25 | — | — | CN | disclosed |
| US-4662905-A | REACTION PRODUCT OF COPPER SALT AND AN IMIDAZOLE, PYRAZOLE, TRIAZOLE, OR TETRAZOLE | Itaru Todoriki, Director of Agency of Industrial Science and Technology (JP) | 1987-05-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170298005-A1 | CURABLE COMPOSITION FOR INKJET, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | BMI1, KDM5B, KDM7A | ALDH1A1 722/4885KDM4E 8/4885GLA 4326/4885 |
| US-20260117105-A1 | POLISHING COMPOSITION HAVING EXCELLENT STORAGE STABILITY AND METHOD FOR PRODUCING SAME | SRPRA, SEM1, PSMA1 | ALDH1A1 4461/4885KDM4E 1628/4885GLA 1442/4885 |
| US-10259773-B2 | Curable composition for inkjet, and method for manufacturing electronic component | BMI1, KDM5B, KDM7A | ALDH1A1 722/4885KDM4E 8/4885GLA 4326/4885 |
| US-12630742-B2 | Polishing composition using polishing particles containing basic substance and having high water affinity | POLR1A, PRMT1, SRRM2 | ALDH1A1 4112/4885KDM4E 3297/4885GLA 2310/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.