Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR2 | Q8TDS4 | 9/20 | 0.49 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.41 |
| ▸ | TNKS | O95271 | 1/20 | 0.41 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.41 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.41 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.41 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.41 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.41 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.41 |
| ▸ | TNKS2 | Q9H2K2 | 1/20 | 0.41 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.41 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.41 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL105268 | 0.94 | MAPT (0.41) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| SCHEMBL105909 | 0.94 | MAPT (0.41) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| SCHEMBL28088080 | 0.83 | HCAR2 (0.47) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| SCHEMBL501366 | 0.78 | THRB (0.43) | KDM4EMAPTHPGDHSD17B10ALDH1A1 | |
| SCHEMBL29023623 | 0.76 | SMN1; SMN2 (0.43) | HCAR2KDM4EMAPTHPGDHSD17B10 | |
| SCHEMBL105291 | 0.74 | TSHR (0.44) | MAPTHSD17B10ALDH1A1LMNACA1 | |
| SCHEMBL105014 | 0.74 | TSHR (0.44) | HSD17B10ALDH1A1LMNACA1CA2 | |
| Phenyl Fumarate SCHEMBL528592 | 0.71 | HCAR2 (0.55) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| Phenyl Fumarate SCHEMBL528591 | 0.71 | HCAR2 (0.55) | HCAR2HDAC3TNKSHDAC4HDAC1 | |
| SCHEMBL106041 | 0.71 | BCAT1 (0.42) | KDM4EHPGDHSD17B10ALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 130 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250237954-A1 | Composition For Forming Metal-Containing Film And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-24 | — | — | US | disclosed |
| CN-117866204-B | Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2024-12-13 | — | — | CN | disclosed |
| CN-112947000-B | Composition for forming silicon-containing EUV resist underlayer film containing sulfonate | 日产化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| US-12084592-B2 | Coating composition for pattern inversion | NISSAN CHEMICAL CORPORATION (JP) | 2024-09-10 | — | — | US | disclosed |
| CN-117866204-A | Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2024-04-12 | — | — | CN | disclosed |
| CN-117866205-A | Silicon-containing surface modifier and resist underlayer film composition, and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2024-04-12 | — | — | CN | disclosed |
| US-20230305405-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| EP-4250008-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-27 | — | — | EP | disclosed |
| CN-112947000-A | Composition for forming silicon-containing EUV resist underlayer film containing sulfonic acid/salt | 日产化学工业株式会社 | 2021-06-11 | — | — | CN | disclosed |
| US-11022884-B2 | Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| US-20100248493-A1 | PHOTOMASK BLANK, PROCESSING METHOD, AND ETCHING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20100147334-A1 | Coated-type silicon-containing film stripping process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-17 | — | — | US | disclosed |
| EP-2196858-A1 | Coated-type silicon-containing film stripping process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-06-16 | — | — | EP | disclosed |
| US-20100086872-A1 | Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| US-20100086870-A1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| EP-2172808-A1 | Metal oxide-containing film-forming composition metal oxide-containing film-formed substrate, and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-04-07 | — | — | EP | disclosed |
| EP-2172807-A1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-04-07 | — | — | EP | disclosed |
| US-20090136869-A1 | METAL OXIDE-CONTAINING FILM-FORMING COMPOSITION, METAL OXIDE-CONTAINING FILM, METAL OXIDE-CONTAINING FILM-BEARING SUBSTRATE, AND PATTERNING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-28 | — | — | US | disclosed |
| US-20090011372-A1 | SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, SILICON-CONTAINING FILM-BEARING SUBSTRATE, AND PATTERNING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20080274432-A1 | SILICONE-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, SILICON-CONTAINING FILM-BEARING SUBSTRATE, AND PATTERNING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-11-06 | — | — | US | disclosed |