Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BCAT1 | P54687 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.39 |
| ▸ | ELANE | P08246 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
| ▸ | ITGB3 | P05106 | 1/20 | 0.39 |
| ▸ | ITGA2B | P08514 | 1/20 | 0.39 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | GGT1 | P19440 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.39 |
| ▸ | BLM | P54132 | 1/20 | 0.39 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | HTR6 | P50406 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8465178 | 0.89 | KMT2A (0.45) | ALDH1A1KMT2ATDP1HSD11B1CES2 | |
| SCHEMBL105291 | 0.81 | TSHR (0.44) | BCAT1ALDH1A1TSHRSMN1; SMN2HSD17B10 | |
| SCHEMBL105014 | 0.81 | TSHR (0.44) | BCAT1ALDH1A1KMT2ATSHRSMN1; SMN2 | |
| SCHEMBL31215190 | 0.80 | BCAT1 (0.46) | BCAT1ALDH1A1KMT2ATSHRSMN1; SMN2 | |
| SCHEMBL28496246 | 0.80 | BCAT1 (0.41) | BCAT1ALDH1A1KMT2ATSHRSMN1; SMN2 | |
| SCHEMBL1764861 | 0.80 | LMNA (0.48) | ALDH1A1KMT2AHPGDTDP1CES2 | |
| SCHEMBL722599 | 0.80 | BCAT1 (0.46) | BCAT1ALDH1A1KMT2ATSHRSMN1; SMN2 | |
| SCHEMBL11136204 | 0.80 | ENPP2 (0.46) | ALDH1A1KMT2ATSHRSMN1; SMN2ELANE | |
| SCHEMBL27840222 | 0.79 | ELANE (0.45) | BCAT1ALDH1A1KMT2ATSHRSMN1; SMN2 | |
| SCHEMBL6261806 | 0.78 | BCAT1 (0.44) | BCAT1ALDH1A1KMT2ATSHRSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 867 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116779434-A | Etching process for electronic functional element with hole for 5G chip | 深圳市盛鸿运科技有限公司 | 2023-09-19 | — | — | CN | claimed |
| EP-1099983-B1 | Chemically amplified positive resist composition and patterning method | SHINETSU CHEMICAL CO (JP) | 2014-08-06 | — | — | EP | claimed |
| US-20070117041-A1 | Photosensitive coating for enhancing a contrast of a photolithographic exposure | INFINEON TECHNOLOGIES AG (DE) | 2007-05-24 | — | — | US | claimed |
| US-20070105043-A1 | Photosensitive coating for enhancing a contrast of a photolithographic exposure | QIMONDA AG (DE) | 2007-05-10 | — | — | US | claimed |
| US-20070092829-A1 | Photosensitive coating for enhancing a contrast of a photolithographic exposure | INFINEON TECHNOLOGIES AG (DE) | 2007-04-26 | — | — | US | claimed |
| WO-2007045498-A2 | PHOTOSENSITIVE COATING FOR ENHANCING A CONTRAST OF A PHOTOLITHOGRAPHIC EXPOSURE | QIMONDA AG (DE) | 2007-04-26 | — | — | WO | claimed |
| EP-0942329-B1 | NOVEL PROCESS FOR PREPARING RESISTS | CLARIANT FINANCE BVI LTD (VG) | 2002-11-13 | — | — | EP | claimed |
| US-20010024765-A1 | Novel process for preparing resists | MERCK PATENT GMBH (DE) | 2001-09-27 | — | — | US | claimed |
| US-6284427-B1 | Process for preparing resists | CLARIANT FINANCE (BVI) LIMITED (VG) | 2001-09-04 | — | — | US | claimed |
| EP-0942329-A1 | NOVEL PROCESS FOR PREPARING RESISTS | Clariant International Ltd. (CH) | 1999-09-15 | — | — | EP | claimed |
| EP-4749365-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-05-27 | — | — | EP | disclosed |
| CN-122072437-A | Chemically amplified negative resist composition and resist pattern forming method | 信越化学工业株式会社 | 2026-05-22 | — | — | CN | disclosed |
| WO-2026100410-A1 | IODINE-CONTAINING POLYMERIZABLE COMPOUND AND IODINE-CONTAINING POLYMER | 三菱瓦斯化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-0611998-A2 | Positive-working radiation-sensitive mixture | HOECHST JAPAN LIMITED (JP) | 1994-08-24 | — | — | EP | disclosed |
| US-4401537-A | EPOXIDE, ONIUM CATALYST AND 3-GLYCIDOXYPROPYL/TRIETHOXYSILANE; CHEMICAL RESISTANCE; ADHESIVES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1983-08-30 | — | — | US | disclosed |
| US-4297401-A | COMPRISING A MIXTURE OF EPOXY-CONTAINING COMPOUND, AN ONIUM CATALYST, AND A SILANE ANCHORING AGENT; HERMETIC SEALING; SHELF LIFE | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1981-10-27 | — | — | US | disclosed |
| US-4156046-A | POLYEPOXIDES, EPOXY-TERMINATED SILANES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1979-05-22 | — | — | US | disclosed |
| US-4101513-A | ONIUM CATALYSTS OF GROUP 5A, 6A OR 7A ATOMS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1978-07-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | BCAT1 3119/4885ALDH1A1 3642/4885KMT2A 111/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | BCAT1 3360/4885ALDH1A1 4452/4885KMT2A 2548/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.