Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 3/20 | 0.43 |
| ▸ | AKT1 | P31749 | 1/20 | 0.42 |
| ▸ | TGM2 | P21980 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | HTR6 | P50406 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | CA1 | P00915 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | THRA | P10827 | 1/20 | 0.33 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP9 | P14780 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL105909 | 0.83 | MAPT (0.41) | SMN1; SMN2TSHRHTR6ALDH1A1CA1 | |
| SCHEMBL105268 | 0.83 | MAPT (0.41) | SMN1; SMN2TSHRHTR6ALDH1A1CA1 | |
| SCHEMBL10408130 | 0.82 | THRB (0.42) | THRBAKT1TGM2SMN1; SMN2TSHR | |
| SCHEMBL27805767 | 0.81 | THRB (0.41) | THRBAKT1TGM2SMN1; SMN2TSHR | |
| SCHEMBL107208 | 0.78 | HCAR2 (0.49) | SMN1; SMN2TSHRALDH1A1CA1CA2 | |
| SCHEMBL105291 | 0.76 | TSHR (0.44) | SMN1; SMN2TSHRHTR6ALDH1A1CA1 | |
| SCHEMBL105014 | 0.76 | TSHR (0.44) | SMN1; SMN2TSHRHTR6ALDH1A1CA1 | |
| SCHEMBL7519403 | 0.74 | THRB (0.40) | THRBAKT1TSHRALDH1A1THRA | |
| SCHEMBL28746619 | 0.73 | THRB (0.41) | THRBAKT1TGM2SMN1; SMN2TSHR | |
| Biphenyl SCHEMBL27622833 | 0.73 | THRB (0.41) | THRBAKT1TGM2SMN1; SMN2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230384677-A1 | ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-30 | — | — | US | disclosed |
| US-10234757-B2 | Polymer, making method, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-19 | — | — | US | disclosed |
| EP-2664633-B1 | POLYMER, MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2018-11-07 | — | — | EP | disclosed |
| US-10054853-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-08-21 | — | — | US | disclosed |
| US-9897916-B2 | Compound, polymer compound, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-20170299963-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-19 | — | — | US | disclosed |
| US-20170038683-A1 | COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-09 | — | — | US | disclosed |
| US-9162967-B2 | Sulfonium salt, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9146464-B2 | Sulfonium salt, polymer, polymer making method, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-29 | — | — | US | disclosed |
| US-9091918-B2 | Sulfonium salt, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20100099042-A1 | POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-22 | — | — | US | disclosed |
| US-20100055608-A1 | POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
| US-20090269696-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| EP-2112554-A2 | Sulfonium salt-containing polymer, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-10-28 | — | — | EP | disclosed |
| US-20090233223-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-17 | — | — | US | disclosed |
| EP-2101217-A1 | Sulfonium salt-containing polymer, resist compositon, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-09-16 | — | — | EP | disclosed |
| EP-2090931-A1 | Positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-08-19 | — | — | EP | disclosed |
| US-20090202943-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-13 | — | — | US | disclosed |
| US-7569326-B2 | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-04 | — | — | US | disclosed |
| US-20080102407-A1 | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-05-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170038683-A1 | COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS | WDR1, WDR26, LBR | THRB 3722/4885AKT1 1173/4885TGM2 3743/4885 |
| US-20100099042-A1 | POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ARSA, ACSL3, ASH2L | THRB 3234/4885AKT1 178/4885TGM2 4566/4885 |
| US-20230384677-A1 | ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | INSR, INSRR, SLC6A5 | THRB 1228/4885AKT1 2895/4885TGM2 4566/4885 |
| US-10054853-B2 | Monomer, polymer, resist composition, and patterning process | ASIC1, PKD1, ARCN1 | THRB 3986/4885AKT1 551/4885TGM2 4341/4885 |
| US-20100055608-A1 | POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ARSA, ACSL3, RAD54L | THRB 3542/4885AKT1 241/4885TGM2 4587/4885 |
| US-20170299963-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ASIC1, PKD1, ARCN1 | THRB 3986/4885AKT1 551/4885TGM2 4341/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.