Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.47 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.47 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.47 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.47 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.47 |
| ▸ | PDE4A | P27815 | 1/20 | 0.47 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.47 |
| ▸ | KDR | P35968 | 1/20 | 0.47 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.47 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.42 |
| ▸ | MAOA | P21397 | 1/20 | 0.42 |
| ▸ | MAOB | P27338 | 1/20 | 0.42 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.41 |
| ▸ | PRSS1 | P07477 | 4/20 | 0.40 |
| ▸ | F2 | P00734 | 2/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17744877 | 0.86 | NR1H4 (0.41) | MAPTCYP3A4LMNATP53ADORA3 | |
| SCHEMBL107648 | 0.85 | KMT2A (0.49) | MAPTCYP3A4LMNATP53ADORA3 | |
| SCHEMBL17744788 | 0.81 | NR1H4 (0.41) | MAPTCYP3A4LMNATP53ADORA3 | |
| SCHEMBL1683900 | 0.80 | ALDH1A1 (0.53) | MAPTCYP3A4KDRMAOAKMT2A | |
| SCHEMBL30014006 | 0.80 | ALDH1A1 (0.53) | MAPTCYP3A4KDRMAOAKMT2A | |
| SCHEMBL6864415 | 0.80 | MAOA (0.51) | MAPTSLC6A3MAOAMAOBALOX5 | |
| SCHEMBL9185619 | 0.79 | NR1H4 (0.54) | MAPTCYP3A4LMNATP53ADORA3 | |
| SCHEMBL9185623 | 0.79 | MCL1 (0.58) | MAPTCYP3A4KDRMAOAKMT2A | |
| SCHEMBL107413 | 0.79 | NR1H4 (0.56) | MAPTCYP3A4LMNATP53ADORA3 | |
| SCHEMBL17744790 | 0.78 | MAPT (0.41) | MAPTCYP3A4LMNATP53ADORA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107207749-B | Bonding of composite materials | 塞特工业公司 | 2021-03-16 | — | — | CN | claimed |
| EP-3227363-B1 | BONDING OF COMPOSITE MATERIALS | CYTEC IND INC (US) | 2020-10-07 | — | — | EP | claimed |
| US-10119001-B2 | Extended room temperature storage of epoxy resins | HEXCEL CORPORATION (US) | 2018-11-06 | — | — | US | claimed |
| EP-3114153-B1 | EXTENDED ROOM TEMPERATURE STORAGE OF EPOXY RESINS | HEXCEL CORP (US) | 2017-11-29 | — | — | EP | claimed |
| US-9789646-B2 | Bonding of composite materials | CYTEC INDUSTRIES INC. (US) | 2017-10-17 | — | — | US | claimed |
| EP-3227363-A1 | BONDING OF COMPOSITE MATERIALS | Cytec Industries Inc. (US) | 2017-10-11 | — | — | EP | claimed |
| WO-2016073192-A1 | BONDING OF COMPOSITE MATERIALS | CYTEC INDUSTRIES INC. (US) | 2016-05-12 | — | — | WO | claimed |
| US-20160121591-A1 | BONDING OF COMPOSITE MATERIALS | CYTEC INDUSTRIES INC. (US) | 2016-05-05 | — | — | US | claimed |
| US-20150252182-A1 | EXTENDED ROOM TEMPERATURE STORAGE OF EPOXY RESINS | HEXCEL CORPORATION (US) | 2015-09-10 | — | — | US | claimed |
| US-20250230328-A1 | POLYAMIC ACID COMPOSITION AND METHOD FOR PREPARING SAME | PI ADVANCED MATERIALS CO., LTD (KR) | 2025-07-17 | — | — | US | disclosed |
| US-20250019541-A1 | POLYAMIC ACID COMPOSITION AND METHOD FOR PREPARING SAME | PI ADVANCED MATERIALS CO., LTD (KR) | 2025-01-16 | — | — | US | disclosed |
| US-20240417592-A1 | POLYIMIDE COATING MATERIAL | PI ADVANCED MATERIALS CO., LTD. (KR) | 2024-12-19 | — | — | US | disclosed |
| US-20240318034-A1 | POLYAMIC ACID COMPOSITION AND POLYIMIDE COATING MATERIAL COMPRISING SAME | PI ADVANCED MATERIALS CO., LTD. (KR) | 2024-09-26 | — | — | US | disclosed |
| EP-4424763-A1 | POLYAMIC ACID COMPOSITION AND METHOD FOR PREPARING SAME | PI Advanced Materials Co., Ltd. (KR) | 2024-09-04 | — | — | EP | disclosed |
| US-8859170-B2 | Photosensitive modified polyimide resin composition and use thereof | PI R&D CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8779085-B2 | Modified polyimide and method for producing modified polyimide | PI R&D CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20120097435-A1 | PHOTOSENSITIVE MODIFIED POLYIMIDE RESIN COMPOSITION AND USE THEREOF | PI R&D CO., LTD. (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120097439-A1 | MODIFIED POLYIMIDE AND METHOD FOR PRODUCING MODIFIED POLYIMIDE | PI R&D CO., LTD. (JP) | 2012-04-26 | — | — | US | disclosed |
| EP-2431400-A2 | MODIFIED POLYIMIDE AND METHOD FOR PRODUCING MODIFIED POLYIMIDE | PI R & D Co. Ltd (JP) | 2012-03-21 | — | — | EP | disclosed |
| EP-2426557-A1 | PHOTOSENSITIVE MODIFIED POLYIMIDE RESIN COMPOSITION AND USE THEREOF | PI R & D Co. Ltd (JP) | 2012-03-07 | — | — | EP | disclosed |