Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | PLA2G2C | Q5R387 | 2/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.42 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.42 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.42 |
| ▸ | CES2 | O00748 | 1/20 | 0.41 |
| ▸ | GALR3 | O60755 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | BLM | P54132 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.41 |
| ▸ | PTAFR | P25105 | 1/20 | 0.41 |
| ▸ | HTR1D | P28221 | 1/20 | 0.41 |
| ▸ | HTR2C | P28335 | 1/20 | 0.41 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.41 |
| ▸ | DRD3 | P35462 | 1/20 | 0.41 |
| ▸ | TMEM97 | Q5BJF2 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL27447449 | 0.98 | ALDH1A1 (0.45) | ALDH1A1PLA2G2CTSHRCHRM2CHRM4 | |
| SCHEMBL15259597 | 0.96 | TDP1 (0.46) | ALDH1A1PLA2G2CTSHRCHRM2CHRM4 | |
| Ethylene Glycol SCHEMBL29015827 | 0.95 | TSHR (0.44) | ALDH1A1PLA2G2CTSHRCHRM2CHRM4 | |
| SCHEMBL2230535 | 0.94 | PLA2G2C (0.49) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL487272 | 0.93 | TDP1 (0.47) | ALDH1A1PLA2G2CTSHRCHRM2CHRM4 | |
| SCHEMBL895988 | 0.93 | TDP1 (0.47) | ALDH1A1PLA2G2CTSHRCHRM2CHRM4 | |
| SCHEMBL896030 | 0.93 | CES2 (0.52) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL466059 | 0.93 | CES2 (0.52) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL6881438 | 0.93 | CES2 (0.52) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL28120656 | 0.89 | ALDH1A1 (0.44) | ALDH1A1PLA2G2CTSHRCHRM2CHRM4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 6451 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147279-A1 | DEVELOPER COMPOSITION FOR METAL-CONTAINING PHOTORESIST, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING METHOD USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2026-05-28 | — | — | US | claimed |
| US-20260016747-A1 | RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-01-15 | — | — | US | claimed |
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| US-12393122-B2 | Thinner composition and method of processing surfaces of semiconductor substrates | SK Hynix Inc. (KR) | 2025-08-19 | — | — | US | claimed |
| CN-119993603-A | Acetic acid-resistant conductive paste, front electrode and solar cell | 成都汉普高新材料有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-119552063-B | Method for separating methanol-methylal mixture | 湖南工程学院 | 2025-05-13 | — | — | CN | claimed |
| WO-2025073152-A1 | PREPARATION AND DIFFUSION TREATMENT METHOD FOR HIGH-PERFORMANCE DIFFUSION COATING USED FOR SINTERED NEODYMIUM-IRON-BORON MAGNET | 浙江鑫盛永磁科技股份有限公司 | 2025-04-10 | — | — | WO | claimed |
| CN-119751742-A | Photosensitive polyacrylate and preparation method thereof, UV (ultraviolet) glue reducing adhesive tape | 深圳先进电子材料国际创新研究院 | 2025-04-04 | — | — | CN | claimed |
| CN-118995105-B | Conductive silver adhesive for Micro-Led adhesion and preparation method and application method thereof | 先禾新材料(苏州)有限公司 | 2025-03-28 | — | — | CN | claimed |
| CN-118109119-B | Long-acting anti-fouling artistic coating and preparation method thereof | 重庆凯茜蔓科技有限公司 | 2025-03-28 | — | — | CN | claimed |
| CN-1412251-A | Nano zinc oxide slurry composition and its preparation method | INST METALS CHINESE ACAD SCI (CN) | 2003-04-23 | — | — | CN | claimed |
| CN-1412258-A | Nano UV resistant acrylate paint | INST METALS CHINESE ACAD SCI (CN) | 2003-04-23 | — | — | CN | claimed |
| CN-1410490-A | Nano titanium dioxide paste composition and its preparation method | INST METALS CHINESE ACAD SCI (CN) | 2003-04-16 | — | — | CN | claimed |
| CN-1389500-A | Separation process of free monomer for polyurethane curing agent | UNIV SOUTH CHINA SCIENCE & ENG (CN) | 2003-01-08 | — | — | CN | claimed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| EP-0846149-B1 | COLOURANT COMPOSITION FOR PAINT PRODUCTS | TIKKURILA CPS OY (FI) | 1999-11-03 | — | — | EP | claimed |
| EP-0616016-B1 | Stripping agent | SCHEIDEL GMBH & CO KG (DE) | 1999-06-30 | — | — | EP | claimed |
| US-5916729-A | A POSITIVE TONE TYPE REISTS CONSISTS OF A RESIN WHICH HAS AN ACIDIC FUNCTIONAL GROUP PROTECTED BY AN ACID DECOMPOSABLE GROUP AND IS HYDROLYZABLE, A PHOTOACID GENERATOR AND A SOLVENT MIXTURE OF ALKYL LACTATE WITH PROPYLENE GLYCOL ETHER | JSR CORPORATION (JP) | 1999-06-29 | — | — | US | claimed |
| EP-0846149-A1 | COLOURANT COMPOSITION FOR PAINT PRODUCTS | Tikkurila CPS Oy (FI) | 1998-06-10 | — | — | EP | claimed |
| WO-1997008255-A1 | COLOURANT COMPOSITION FOR PAINT PRODUCTS | TIKKURILA CPS OY (FI) | 1997-03-06 | — | — | WO | claimed |