Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLA2G2C | Q5R387 | 7/20 | 0.49 |
| ▸ | CES2 | O00748 | 1/20 | 0.48 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.46 |
| ▸ | PTAFR | P25105 | 1/20 | 0.46 |
| ▸ | HTR1D | P28221 | 1/20 | 0.46 |
| ▸ | HTR2C | P28335 | 1/20 | 0.46 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.46 |
| ▸ | DRD3 | P35462 | 1/20 | 0.46 |
| ▸ | TMEM97 | Q5BJF2 | 1/20 | 0.46 |
| ▸ | USP2 | O75604 | 1/20 | 0.46 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | LPAR5 | Q9H1C0 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL466059 | 0.98 | CES2 (0.52) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL896030 | 0.98 | CES2 (0.52) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL6881438 | 0.98 | CES2 (0.52) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL107643 | 0.94 | ALDH1A1 (0.47) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL6531007 | 0.93 | TDP1 (0.46) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL19064961 | 0.93 | TDP1 (0.46) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| Water SCHEMBL27447449 | 0.93 | ALDH1A1 (0.45) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL896773 | 0.92 | PLA2G2C (0.47) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL896910 | 0.92 | PLA2G2C (0.47) | PLA2G2CCES2ADRA1DPTAFRHTR1D | |
| SCHEMBL15259597 | 0.91 | TDP1 (0.46) | PLA2G2CCES2ADRA1DPTAFRHTR1D |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9427777-B2 | Process for producing charge retention medium | ASAHI GLASS COMPANY, LIMITED (JP) | 2016-08-30 | — | — | US | claimed |
| CN-118510877-A | Cleaning composition for pretreatment of metal substrates, method for the production thereof and use thereof | 巴斯夫涂料有限公司 | 2024-08-16 | — | — | CN | disclosed |
| EP-4318629-A1 | PRIMER FOR POWER STORAGE DEVICE ELECTRODES, COMPOSITION FOR FORMING PRIMER LAYER, ELECTRODE FOR POWER STORAGE DEVICES, AND SECONDARY BATTERY | AGC INC. (JP) | 2024-02-07 | — | — | EP | disclosed |
| US-20230420686-A1 | PRIMER FOR POWER STORAGE DEVICE ELECTRODE, COMPOSITION FOR FORMING PRIMER LAYER, ELECTRODE FOR POWER STORAGE DEVICE, AND SECONDARY BATTERY | AGC Inc. (JP) | 2023-12-28 | — | — | US | disclosed |
| CN-117043978-A | Primer for electrode of electric storage device, primer-forming composition, electrode for electric storage device, and secondary battery | ＡＧＣ株式会社 | 2023-11-10 | — | — | CN | disclosed |
| WO-2023131530-A1 | A CLEANING COMPOSITION FOR METAL SUBSTRATES PRETREATMENT AND ITS PREPARATION METHOD AND APPLICATION THEREOF | BASF COATINGS GMBH (DE) | 2023-07-13 | — | — | WO | disclosed |
| CN-114787717-A | Processing liquid and pattern forming method | 富士胶片株式会社 | 2022-07-22 | — | — | CN | disclosed |
| US-20210114967-A1 | RESIST COMPOSITION FOR PATTERN PRINTING AND PATTERN FORMING METHOD | KANEKA CORPORATION (JP) | 2021-04-22 | — | — | US | disclosed |
| EP-3806593-A1 | RESIST COMPOSITION FOR PATTERN PRINTING USE, AND METHOD FOR MANUFACTURING CIRCUIT PATTERN USING SAME | KANEKA CORPORATION (JP) | 2021-04-14 | — | — | EP | disclosed |
| US-20210103216-A1 | RESIST COMPOSITION FOR PATTERN PRINTING, AND PRODUCTION METHOD OF CIRCUIT PATTERNS USING THE SAME | KANEKA CORPORATION (JP) | 2021-04-08 | — | — | US | disclosed |
| US-20130017334-A1 | COATING COMPOSITION AND PROCESS FOR ITS PRODUCTION, AND PROCESS FOR FORMING COATING FILM BY USING THE COMPOSITION | ASAHI GLASS COMPANY, LIMITED (JP) | 2013-01-17 | — | — | US | disclosed |
| CN-102844388-A | Coating composition and production method for same, and formation method for coating film using same | ASAHI GLASS CO LTD | 2012-12-26 | — | — | CN | disclosed |
| CN-102844884-A | Back sheet for solar cell module and solar cell module | ASAHI GLASS CO LTD | 2012-12-26 | — | — | CN | disclosed |
| CN-102471553-A | Fluorine-containing copolymer composition and method for producing same | ASAHI GLASS CO LTD | 2012-05-23 | — | — | CN | disclosed |
| EP-2450406-A1 | FLUORINE-CONTAINING COPOLYMER COMPOSITION AND METHOD FOR PRODUCING SAME | Asahi Glass Company, Limited (JP) | 2012-05-09 | — | — | EP | disclosed |
| US-20120108723-A1 | FLUOROCOPOLYMER COMPOSITION AND ITS PRODUCTION PROCESS | ASAHI GLASS COMPANY, LIMITED (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20110195846-A1 | Liquid Pyraclostrobin-Containing Crop Protection Formulations | BASF SE (DE) | 2011-08-11 | — | — | US | disclosed |
| EP-2346322-A2 | LIQUID PYRACLOSTROBIN-CONTAINING CROP PROTECTION FORMULATIONS | BASF SE (DE) | 2011-07-27 | — | — | EP | disclosed |
| WO-2010040835-A2 | LIQUID PYRACLOSTROBIN-CONTAINING CROP PROTECTION FORMULATIONS | BASF SE (DE) | 2010-04-15 | — | — | WO | disclosed |
| US-20060177767-A1 | Photosensitive resin composition, thin film panel including a layer made from photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO., LTD. | 2006-08-10 | — | — | US | disclosed |