Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.78 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.78 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.58 |
| ▸ | CA12 | O43570 | 3/20 | 0.56 |
| ▸ | CA1 | P00915 | 3/20 | 0.56 |
| ▸ | CA2 | P00918 | 3/20 | 0.56 |
| ▸ | CA4 | P22748 | 3/20 | 0.56 |
| ▸ | CA7 | P43166 | 3/20 | 0.56 |
| ▸ | CA9 | Q16790 | 3/20 | 0.56 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.56 |
| ▸ | HMGB1 | P09429 | 2/20 | 0.56 |
| ▸ | HPGD | P15428 | 2/20 | 0.56 |
| ▸ | NAPRT | Q6XQN6 | 2/20 | 0.56 |
| ▸ | CA6 | P23280 | 1/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.56 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.56 |
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.54 |
| ▸ | MYC | P01106 | 3/20 | 0.54 |
| ▸ | NR4A1 | P22736 | 2/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phthalic Acid SCHEMBL11118156 | 0.91 | ALDH1A1 (0.93) | ALDH1A1ALOX15AKR1C3CA12CA1 | |
| Phthalic Acid SCHEMBL107836 | 0.89 | ALDH1A1 (0.61) | ALDH1A1ALOX15AKR1C3CA12CA1 | |
| Phthalic Acid SCHEMBL2989047 | 0.89 | ALDH1A1 (0.61) | ALDH1A1ALOX15AKR1C3CA12CA1 | |
| Phthalic Acid SCHEMBL27392154 | 0.88 | ALDH1A1 (0.88) | ALDH1A1ALOX15AKR1C3CA12CA1 | |
| Phthalic Acid SCHEMBL4797005 | 0.88 | ALDH1A1 (0.88) | ALDH1A1ALOX15AKR1C3CA12CA1 | |
| Phthalic Acid SCHEMBL27470430 | 0.88 | ALDH1A1 (0.88) | ALDH1A1ALOX15AKR1C3CA12CA1 | |
| Phthalic Acid SCHEMBL4396104 | 0.88 | ALDH1A1 (0.88) | ALDH1A1ALOX15AKR1C3CA12CA1 | |
| Phthalic Acid SCHEMBL30575217 | 0.88 | ALDH1A1 (0.88) | ALDH1A1ALOX15AKR1C3CA12CA1 | |
| Phthalic Acid SCHEMBL1332278 | 0.88 | ALDH1A1 (1.00) | ALDH1A1ALOX15AKR1C3CA12CA1 | |
| Phthalic Acid SCHEMBL10477086 | 0.88 | ALDH1A1 (1.00) | ALDH1A1ALOX15AKR1C3CA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 212 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113113233-A | Solid-liquid mixed winding type aluminum electrolytic capacitor and preparation method thereof | 深圳市金富康电子有限公司 | 2021-07-13 | — | — | CN | claimed |
| EP-1563822-B1 | Dental material based on alkoxysilyl functional polyether comprising a catalyst | KETTENBACH GMBH & CO KG (DE) | 2020-09-02 | — | — | EP | claimed |
| CN-102176379-B | Ternary mixed solvent with high boiling point and low freezing point and application thereof | DONGGUAN WIN SHINE ELECTRONIC CO LTD | 2012-11-21 | — | — | CN | claimed |
| US-20070275284-A1 | LIQUID ELECTROLYTE FOR AN ELECTROCHEMICAL CELL | MERRITT DONALD R | 2007-11-29 | — | — | US | claimed |
| US-5972862-A | COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT | MITSUBISHI GAS CHEMICAL (JP) | 1999-10-26 | — | — | US | claimed |
| US-5457599-A | Solute for electrolyte is quaternaryammonium salt of caboxylic acid selected from phthalic acid, tetrahydrophthalic acid, maleic acid, hexahydrophthalic acid or an alkyl or nitro substituent of above acids; high temperature stability | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1995-10-10 | — | — | US | claimed |
| US-5006964-A | Low equivalent series resistance and low rates of change with time on voltage | SPRAGUE ELECTRIC COMPANY (US) | 1991-04-09 | — | — | US | claimed |
| US-4885115-A | Liquid electrolyte for use in electrolytic capacitor | NIPPON CHEMI-CON CORPORATION (JP) | 1989-12-05 | — | — | US | claimed |
| JP-3091225-A | — | — | None | — | — | JP | disclosed |
| JP-63302514-A | — | — | None | — | — | JP | disclosed |
| JP-2063108-A | — | — | None | — | — | JP | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-5006964-A | Low equivalent series resistance and low rates of change with time on voltage | SPRAGUE ELECTRIC COMPANY (US) | 1991-04-09 | — | — | US | disclosed |
| US-4915861-A | DICARBOXYLIC ACID SALT OF TETRAMETHYLAMMONIUM | NIPPON CHEMI-CON CORPORATION (JP) | 1990-04-10 | — | — | US | disclosed |
| JP-H0263108-A | ELECTROLYTIC CAPACITOR | ASAHI GLASS CO LTD | 1990-03-02 | — | — | JP | disclosed |
| US-4892944-A | Process for producing quaternary salts | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1990-01-09 | — | — | US | disclosed |
| JP-S63302514-A | ELECTROLYTE FOR DRIVING ALUMINUM ELECTROLYTIC CAPACITOR | NICHICON CORP | 1988-12-09 | — | — | JP | disclosed |
| EP-0291074-A2 | Process for producing quaternary salts | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1988-11-17 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | ALDH1A1 4452/4885ALOX15 4108/4885AKR1C3 4530/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | ALDH1A1 1558/4885ALOX15 326/4885AKR1C3 696/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.