Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.61 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.48 |
| ▸ | CA2 | P00918 | 4/20 | 0.46 |
| ▸ | CA4 | P22748 | 4/20 | 0.46 |
| ▸ | CA12 | O43570 | 3/20 | 0.46 |
| ▸ | CA1 | P00915 | 3/20 | 0.46 |
| ▸ | CA7 | P43166 | 3/20 | 0.46 |
| ▸ | CA9 | Q16790 | 3/20 | 0.46 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.46 |
| ▸ | CA6 | P23280 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.46 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.46 |
| ▸ | MYC | P01106 | 3/20 | 0.46 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phthalic Acid SCHEMBL2989047 | 1.00 | ALDH1A1 (0.61) | ALDH1A1ALOX15KDM4EHPGDAKR1C3 | |
| Phthalic Acid SCHEMBL27328637 | 0.91 | ALDH1A1 (0.67) | ALDH1A1ALOX15KDM4EHPGDAKR1C3 | |
| Phthalic Acid SCHEMBL107834 | 0.91 | ALDH1A1 (0.56) | ALDH1A1ALOX15KDM4EHPGDCA2 | |
| Phthalic Acid SCHEMBL27578458 | 0.89 | ALDH1A1 (0.64) | ALDH1A1ALOX15KDM4EHPGDAKR1C3 | |
| Phthalic Acid SCHEMBL3914685 | 0.89 | ALDH1A1 (0.70) | ALDH1A1ALOX15KDM4EHPGDAKR1C3 | |
| Phthalic Acid SCHEMBL1930940 | 0.89 | ALDH1A1 (0.70) | ALDH1A1ALOX15KDM4EHPGDAKR1C3 | |
| Phthalic Acid SCHEMBL588315 | 0.89 | ALDH1A1 (0.70) | ALDH1A1ALOX15KDM4EHPGDAKR1C3 | |
| Phthalic Acid SCHEMBL192153 | 0.89 | ALDH1A1 (0.70) | ALDH1A1ALOX15KDM4EHPGDAKR1C3 | |
| Phthalic Acid SCHEMBL7030041 | 0.89 | ALDH1A1 (0.70) | ALDH1A1ALOX15KDM4EHPGDAKR1C3 | |
| Phthalic Acid SCHEMBL1157124 | 0.89 | ALDH1A1 (0.70) | ALDH1A1ALOX15KDM4EHPGDAKR1C3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 191 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113113233-A | Solid-liquid mixed winding type aluminum electrolytic capacitor and preparation method thereof | 深圳市金富康电子有限公司 | 2021-07-13 | — | — | CN | claimed |
| CN-102176379-B | Ternary mixed solvent with high boiling point and low freezing point and application thereof | DONGGUAN WIN SHINE ELECTRONIC CO LTD | 2012-11-21 | — | — | CN | claimed |
| CN-102779654-A | Manufacture method of solid electrolyte aluminum electrolytic capacitor | ZHAOQING BERYL ELECTRONIC CO LTD | 2012-11-14 | — | — | CN | claimed |
| US-6462005-B1 | AQUEOUS SOLUTION CONTAINING A QUARTERNARY AMMONIUM SALT, A FLUORO COMPOUND AND OPTIONALLY AN ORGANIC SOLVENT; PROTECTING DEPOSITION FILM TO BE REMOVED; NO CORROSION OF CONDUCTIVE LAYER BEING DECONTAMINATED | TEXAS INSTRUMENTS INCORPORATED | 2002-10-08 | — | — | US | claimed |
| US-5972862-A | COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT | MITSUBISHI GAS CHEMICAL (JP) | 1999-10-26 | — | — | US | claimed |
| US-4885115-A | Liquid electrolyte for use in electrolytic capacitor | NIPPON CHEMI-CON CORPORATION (JP) | 1989-12-05 | — | — | US | claimed |
| JP-63302514-A | — | — | None | — | — | JP | disclosed |
| JP-2063108-A | — | — | None | — | — | JP | disclosed |
| JP-11186109-A | — | — | None | — | — | JP | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-5587871-A | CONTAINING AN ORGANIC POLAR SOLVENT AND AN IONIC SOLUTE WITH FINE PARTICLES OF AN ALUMINOSILICATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-12-24 | — | — | US | disclosed |
| EP-0662705-A2 | Cleaning agent for semiconductor device and method for manufacturing semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1995-07-12 | — | — | EP | disclosed |
| EP-0543311-B1 | Electrolytic solution for electrolytic capacitor | NIPPON CHEMICON (JP) | 1995-06-28 | — | — | EP | disclosed |
| EP-0543311-A2 | Electrolytic solution for electrolytic capacitor | NIPPON CHEMI-CON CORPORATION (JP) | 1993-05-26 | — | — | EP | disclosed |
| US-4915861-A | DICARBOXYLIC ACID SALT OF TETRAMETHYLAMMONIUM | NIPPON CHEMI-CON CORPORATION (JP) | 1990-04-10 | — | — | US | disclosed |
| JP-H0263108-A | ELECTROLYTIC CAPACITOR | ASAHI GLASS CO LTD | 1990-03-02 | — | — | JP | disclosed |
| JP-S63302514-A | ELECTROLYTE FOR DRIVING ALUMINUM ELECTROLYTIC CAPACITOR | NICHICON CORP | 1988-12-09 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | ALDH1A1 4452/4885ALOX15 4108/4885KDM4E 588/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | ALDH1A1 1558/4885ALOX15 326/4885KDM4E 2013/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.