Potassium Ion

Potassium Ion

SCHEMBL108215

[Au+3].[Au].[C-]#N.[C-]#N.[C-]#N.[C-]#N.[K+]

nearest known ligand 0.67

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.43
CA4 P22748 1/20 0.43
CA2 P00918 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL11586582 0.91 CA1 (0.50) CA1CA4CA2
Potassium Ion SCHEMBL44034 0.91 CA1 (0.50) CA1CA4CA2
Potassium Ion SCHEMBL44036 0.91
Hydrochloric Acid SCHEMBL8749562 0.83 CA1 (0.43) CA1CA4CA2
Hydrochloric Acid SCHEMBL9808348 0.83
SCHEMBL11586203 0.82 CA1 (0.60) CA1CA4CA2
SCHEMBL123095 0.82
Potassium Ion SCHEMBL1332522 0.82
Potassium Ion SCHEMBL1331713 0.82
Potassium Ion SCHEMBL1284 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120097439-A1 MODIFIED POLYIMIDE AND METHOD FOR PRODUCING MODIFIED POLYIMIDE PI R&D CO., LTD. (JP) 2012-04-26 US disclosed
US-20120097435-A1 PHOTOSENSITIVE MODIFIED POLYIMIDE RESIN COMPOSITION AND USE THEREOF PI R&D CO., LTD. (JP) 2012-04-26 US disclosed
EP-2431400-A2 MODIFIED POLYIMIDE AND METHOD FOR PRODUCING MODIFIED POLYIMIDE PI R & D Co. Ltd (JP) 2012-03-21 EP disclosed
EP-2426557-A1 PHOTOSENSITIVE MODIFIED POLYIMIDE RESIN COMPOSITION AND USE THEREOF PI R & D Co. Ltd (JP) 2012-03-07 EP disclosed