Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4198531 | 0.84 | ALDH1A1 (0.37) | ALDH1A1 | |
| SCHEMBL450766 | 0.84 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL10615471 | 0.83 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL3953694 | 0.81 | — | — | |
| SCHEMBL3053351 | 0.81 | MEN1 (0.33) | ALDH1A1 | |
| SCHEMBL7038409 | 0.80 | — | — | |
| SCHEMBL971472 | 0.80 | TSHR (0.31) | ALDH1A1 | |
| SCHEMBL3957946 | 0.80 | ALDH1A1 (0.36) | ALDH1A1 | |
| SCHEMBL453582 | 0.80 | EPHX2 (0.31) | ALDH1A1 | |
| SCHEMBL19052008 | 0.78 | ALDH1A1 (0.31) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 188 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260029717-A1 | PITCH SPLITTING FOR EUV IMAGING | TOKYO ELECTRON LTD (JP) | 2026-01-29 | — | — | US | claimed |
| WO-2026100410-A1 | IODINE-CONTAINING POLYMERIZABLE COMPOUND AND IODINE-CONTAINING POLYMER | 三菱瓦斯化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20260029717-A1 | PITCH SPLITTING FOR EUV IMAGING | TOKYO ELECTRON LTD (JP) | 2026-01-29 | — | — | US | disclosed |
| US-20250250216-A1 | CYCLIC COMPOUND HAVING IODINE ATOM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-08-07 | — | — | US | disclosed |
| CN-120136704-A | Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound | 三菱瓦斯化学株式会社 | 2025-06-13 | — | — | CN | disclosed |
| CN-120136703-A | Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound | 三菱瓦斯化学株式会社 | 2025-06-13 | — | — | CN | disclosed |
| WO-2025079631-A1 | COMPOSITION, RESIN COMPOSITION, COMPOSITION FOR FILM FORMATION, COMPOSITION FOR FORMING LITHOGRAPHIC FILM, AND COMPOSITION FOR FORMING RESIST FILM | 三菱瓦斯化学株式会社 | 2025-04-17 | — | — | WO | disclosed |
| WO-2025079648-A1 | COMPOUND, COMPOSITION, RESIN COMPOSITION, COMPOSITION FOR FORMING FILM, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, AND COMPOSITION FOR FORMING RESIST FILM | 三菱瓦斯化学株式会社 | 2025-04-17 | — | — | WO | disclosed |
| US-20250109325-A1 | RELEASABILITY-IMPARTING AGENT, ADHESIVE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-03 | — | — | US | disclosed |
| US-12264073-B2 | Composite material | ADEKA CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| EP-1376233-A2 | Method of producing a resin for a radiation-sensitive material | Daicel Chemical Industries, Ltd. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030225233-A1 | Novel process for producing anhydride-containing polymers for radiation sensitive compositions | ARCH SPECIALTY CHEMICALS, INC. | 2003-12-04 | — | — | US | disclosed |
| WO-2003080688-A1 | A NOVEL PROCESS FOR PRODUCING ANHYDRIDE-CONTAINING POLYMERS FOR RADIATION SENSITIVE COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-10-02 | — | — | WO | disclosed |
| US-20030143482-A1 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | FUJITSU LIMITED (JP) | 2003-07-31 | — | — | US | disclosed |
| US-20030138724-A1 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | FUJITSU LIMITED (JP) | 2003-07-24 | — | — | US | disclosed |
| US-20030138725-A1 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | FUJITSU LIMITED (JP) | 2003-07-24 | — | — | US | disclosed |
| US-20030138726-A1 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | FUJITSU LIMITED (JP) | 2003-07-24 | — | — | US | disclosed |
| US-6506534-B1 | A negative resist composition developable with basic solutions and being itself soluble in basic aqueous solutions but, upon exposure to said image-forming radiation, being rendered insoluble in basic aqueous solutions at its exposed sections | FUJITSU LIMITED (JP) | 2003-01-14 | — | — | US | disclosed |
| US-6479211-B1 | FOR FAR ULTRAVIOLET EXPOSURE, WHICH CAN FORM A HIGHLY PRECISE PATTERN USING LIGHT IN THE FAR ULTRAVIOLET REGION INCLUDING AN EXCIMER LASER RAY, PARTICULARLY, IN THE REGION OF 250 NM OR LESS | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-12 | — | — | US | disclosed |
| EP-0936504-A1 | A radiation-sensitive material and a method for forming a pattern therewith | Daicel Chemical Industries, Ltd. (JP) | 1999-08-18 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250250216-A1 | CYCLIC COMPOUND HAVING IODINE ATOM | IGF1R, SSTR1, CCNI | ALDH1A1 1637/4885 |
| US-20260029717-A1 | PITCH SPLITTING FOR EUV IMAGING | ELAVL3, ELAVL1, RUVBL2 | ALDH1A1 1924/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.