Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3058365 | 0.80 | ALDH1A1 (0.30) | ALDH1A1 | |
| SCHEMBL450766 | 0.80 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL108706 | 0.80 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL10615471 | 0.79 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL3953694 | 0.78 | — | — | |
| SCHEMBL453582 | 0.77 | EPHX2 (0.31) | ALDH1A1 | |
| SCHEMBL3957946 | 0.77 | ALDH1A1 (0.36) | TSHREPHX1ALDH1A1 | |
| SCHEMBL7038409 | 0.77 | — | — | |
| SCHEMBL19052008 | 0.74 | ALDH1A1 (0.31) | TSHRALDH1A1 | |
| SCHEMBL8101418 | 0.74 | ATM (0.44) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12578644-B2 | Upper film-forming composition and method for producing phase-separated pattern | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| CN-117950267-A | Photosensitive resin composition, photosensitive dry film and PCB printed circuit board | 杭州福斯特电子材料有限公司 | 2024-04-30 | — | — | CN | disclosed |
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-11762292-B2 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2023-09-19 | — | — | US | disclosed |
| US-20230280654-A1 | UPPER FILM-FORMING COMPOSITION AND METHOD FOR PRODUCING PHASE-SEPARATED PATTERN | NISSAN CHEMICAL CORPORATION (JP) | 2023-09-07 | — | — | US | disclosed |
| US-20230099348-A1 | PHOTORESIST COMPOSITION COMPRISING AMIDE COMPOUND AND PATTERN FORMATION METHODS USING THE SAME | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2023-03-30 | — | — | US | disclosed |
| CN-115808844-A | Photoresist composition comprising amide compound and pattern forming method using the same | 罗门哈斯电子材料韩国有限公司 | 2023-03-17 | — | — | CN | disclosed |
| US-10336851-B2 | Copolymer for semiconductor lithography, resist composition, and method for manufacturing substrate | MITSUBISHI CHEMICAL CORPORATION | 2019-07-02 | — | — | US | disclosed |
| US-9778568-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-9527938-B2 | Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate | MITSUBISHI RAYON CO., LTD. (JP) | 2016-12-27 | — | — | US | disclosed |
| EP-2287670-A1 | Methods of forming electronic devices | Rohm and Haas Electronic Materials, L.L.C. (US) | 2011-02-23 | — | — | EP | disclosed |
| EP-2287668-A1 | Methods of forming electronic devices | Rohm and Haas Electronic Materials, L.L.C. (US) | 2011-02-23 | — | — | EP | disclosed |
| EP-2287669-A1 | Methods of forming electronic devices | Rohm and Haas Electronic Materials, L.L.C. (US) | 2011-02-23 | — | — | EP | disclosed |
| US-20110008729-A1 | COMPOSITIONS AND METHODS FOR FORMING ELECTRONIC DEVICES | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-01-13 | — | — | US | disclosed |
| US-20100330503-A1 | METHODS OF FORMING ELECTRONIC DEVICES | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-12-30 | — | — | US | disclosed |
| US-20100330471-A1 | METHODS OF ADJUSTING DIMENSIONS OF RESIST PATTERNS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-12-30 | — | — | US | disclosed |
| US-20100330498-A1 | SELF-ALIGNED SPACER MULTIPLE PATTERNING METHODS | ROHM AND HAAS ELECTRONICS MATERIALS LLC (US) | 2010-12-30 | — | — | US | disclosed |
| US-20100330499-A1 | METHODS OF FORMING ELECTRONIC DEVICES | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-12-30 | — | — | US | disclosed |
| US-20100330501-A1 | METHODS OF FORMING ELECTRONIC DEVICES | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-12-30 | — | — | US | disclosed |
| US-20100330500-A1 | METHODS OF FORMING ELECTRONIC DEVICES | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-12-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12578644-B2 | Upper film-forming composition and method for producing phase-separated pattern | SMCHD1, SSU72, TPR | TSHR 3674/4885EPHX1 2906/4885NPC1 3023/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.