Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 8/20 | 0.32 |
| ▸ | CA2 | P00918 | 8/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | GPR3 | P46089 | 1/20 | 0.32 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.32 |
| ▸ | NR3C1 | P04150 | 3/20 | 0.32 |
| ▸ | PGR | P06401 | 3/20 | 0.32 |
| ▸ | NR3C2 | P08235 | 3/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3132444 | 1.00 | CA1 (0.32) | CA1CA2CYP1A2CYP3A4CYP2C19 | |
| SCHEMBL60073 | 0.99 | CYP1A2 (0.33) | CA1CA2CYP1A2CYP3A4CYP2C19 | |
| SCHEMBL5692909 | 0.87 | RAPGEF4 (0.33) | CYP1A2CYP3A4CYP2C19MEN1CYP2D6 | |
| SCHEMBL4853778 | 0.85 | GPR3 (0.36) | CA1CA2CYP1A2CYP3A4CYP2C19 | |
| Trifluoromethanesulfonic Acid SCHEMBL546940 | 0.85 | GPR3 (0.43) | CYP1A2CYP3A4CYP2C19MEN1CYP2D6 | |
| SCHEMBL546898 | 0.84 | CA1 (0.35) | CA1CA2CYP1A2CYP3A4CYP2C19 | |
| SCHEMBL1089841 | 0.84 | CA1 (0.35) | CA1CA2CYP1A2CYP3A4CYP2C19 | |
| SCHEMBL3132979 | 0.84 | CA1 (0.35) | CA1CA2CYP1A2CYP3A4CYP2C19 | |
| SCHEMBL3132822 | 0.84 | CA1 (0.35) | CA1CA2CYP1A2CYP3A4CYP2C19 | |
| SCHEMBL4859794 | 0.84 | GPR3 (0.36) | CYP1A2CYP3A4CYP2C19MEN1CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | disclosed |
| EP-2387735-B1 | NONPOLYMERIC BINDERS FOR SEMICONDUCTOR SUBSTRATE COATINGS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-03-13 | — | — | EP | disclosed |
| EP-1676835-B1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | WAKO PURE CHEM IND LTD (JP) | 2014-12-10 | — | — | EP | disclosed |
| US-8802346-B2 | Metal compositions and methods of making same | PRYOG, LLC (US) | 2014-08-12 | — | — | US | disclosed |
| US-8709705-B2 | Metal-containing compositions and method of making same | PRYOG, LLC (US) | 2014-04-29 | — | — | US | disclosed |
| US-8535872-B2 | Thermally cured underlayer for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2013-09-17 | — | — | US | disclosed |
| US-20120315451-A1 | Metal-Containing Compositions and Method of Making Same | PRYOG LLC | 2012-12-13 | — | — | US | disclosed |
| US-20120178871-A1 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | DE BINOD B (US) | 2012-07-12 | — | — | US | disclosed |
| US-8153346-B2 | Hydroxyl containing polymer, amino crosslinking agent and thermal acid generator; undercoating for multilayer lithography material | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2012-04-10 | — | — | US | disclosed |
| US-20050042542-A1 | Novel photosensitive bilayer composition | ARCH SPECIALTY CHEMICALS, INC. | 2005-02-24 | — | — | US | disclosed |
| US-6855476-B2 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-02-15 | — | — | US | disclosed |
| EP-1457822-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-09-15 | — | — | EP | disclosed |
| US-6696219-B2 | MULTILAYER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-24 | — | — | US | disclosed |
| EP-1299774-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-09 | — | — | EP | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| US-20020197558-A1 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. | 2002-12-26 | — | — | US | disclosed |
| WO-2002082185-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |
| US-20020028409-A1 | Positive resist laminate | FUJI PHOTO FILM CO., LTD. | 2002-03-07 | — | — | US | disclosed |
| WO-2001022162-A2 | RADIATION SENSITIVE COPOLYMERS, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEMS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2001-03-29 | — | — | WO | disclosed |