SCHEMBL5692909

SCHEMBL5692909

Cc1cc(C)c([S+](c2ccccc2)c2ccccc2)c(C)c1.FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 1/20 0.33
SLC6A2 P23975 2/20 0.32
SLC6A4 P31645 2/20 0.32
SLC6A3 Q01959 2/20 0.32
PDK2 Q15119 1/20 0.32
CYP1A2 P05177 3/20 0.32
CYP2A6 P11509 1/20 0.32
CYP3A4 P08684 2/20 0.31
CYP2C19 P33261 2/20 0.31
MEN1 O00255 1/20 0.31
CYP2D6 P10635 1/20 0.31
TSHR P16473 1/20 0.31
KMT2A Q03164 1/20 0.31
FFAR4 Q5NUL3 1/20 0.30
NR3C1 P04150 1/20 0.30
PGR P06401 1/20 0.30
NR3C2 P08235 1/20 0.30
MAPT P10636 1/20 0.30
MAPK1 P28482 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6654424 0.87 GAA (0.33)
SCHEMBL3132444 0.87 CA1 (0.32) CYP1A2CYP3A4CYP2C19MEN1CYP2D6
SCHEMBL1088488 0.87 CA1 (0.32) CYP1A2CYP3A4CYP2C19MEN1CYP2D6
SCHEMBL424812 0.86 CYP1A2 (0.40) RAPGEF4SLC6A2SLC6A4SLC6A3CYP1A2
SCHEMBL60073 0.85 CYP1A2 (0.33) CYP1A2CYP3A4CYP2C19MEN1CYP2D6
Bromide SCHEMBL3144004 0.84 CYP1A2 (0.39) RAPGEF4SLC6A2SLC6A4SLC6A3CYP1A2
Hydrochloric Acid SCHEMBL6764989 0.84 CYP1A2 (0.39) RAPGEF4SLC6A2SLC6A4SLC6A3CYP1A2
SCHEMBL3136259 0.82 CYP1A2 (0.35) RAPGEF4SLC6A2SLC6A4SLC6A3CYP1A2
SCHEMBL3183538 0.82 CYP1A2 (0.40) RAPGEF4SLC6A2SLC6A4SLC6A3CYP1A2
Trifluoromethanesulfonic Acid SCHEMBL546940 0.80 GPR3 (0.43) RAPGEF4CYP1A2CYP3A4CYP2C19MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1656590-A2 NOVEL PHOTOSENSITIVE BILAYER COMPOSITION FujiFilm Electronic Materials USA, Inc. (US) 2006-05-17 EP disclosed
WO-2005022257-A2 NOVEL PHOTOSENSITIVE BILAYER COMPOSITION ARCH SPECIALTY CHEMICALS, INC. (US) 2005-03-10 WO disclosed