SCHEMBL1088537

SCHEMBL1088537

CC(=O)OC1CC2C=CC1O2

nearest known ligand 0.37

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.37
CHRM2 P08172 5/20 0.34
CHRM1 P11229 3/20 0.34
CHRM4 P08173 2/20 0.34
CHRM3 P20309 2/20 0.34
MEN1 O00255 1/20 0.33
CYP2D6 P10635 1/20 0.33
KMT2A Q03164 1/20 0.33
CA12 O43570 2/20 0.31
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
CA9 Q16790 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7024800 0.83
SCHEMBL2962835 0.83 GPX4 (0.37)
SCHEMBL9696641 0.78 ALDH1A1 (0.36) TSHRKMT2A
SCHEMBL17662660 0.71
SCHEMBL6367869 0.70 NLRP3 (0.39) TSHRMEN1CYP2D6KMT2ACA12
SCHEMBL6367856 0.70 KDM4E (0.30)
SCHEMBL4380706 0.68
SCHEMBL7715622 0.67 OGA (0.37) TSHRCYP2D6CA12CA1CA2
SCHEMBL23264992 0.67 CYP1A2 (0.35) TSHRCHRM2CHRM4CHRM3CYP2D6
SCHEMBL2960975 0.67 CYP1A2 (0.35) TSHRCHRM2CHRM4CHRM3CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8535872-B2 Thermally cured underlayer for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2013-09-17 US disclosed
EP-1655321-B1 POLYMERIZABLE COMPOSITIONS AND MOLDED ARTICLES PRODUCED BY USING THE SAME ZEON CORP (JP) 2012-11-21 EP disclosed
US-20120178871-A1 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION DE BINOD B (US) 2012-07-12 US disclosed
US-8153346-B2 Hydroxyl containing polymer, amino crosslinking agent and thermal acid generator; undercoating for multilayer lithography material FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2012-04-10 US disclosed
US-7771834-B2 Method of manufacturing thermoplastic resin, crosslinked resin, and crosslinked resin composite material ZEON CORPORATION (JP) 2010-08-10 US disclosed
US-7666966-B2 Method of manufacturing thermoplastic resin, crosslinked resin, and crosslinked resin composite material ZEON CORPORATION (JP) 2010-02-23 US disclosed
US-20100015871-A1 MOLDED ARTICLE, PROCESS FOR PRODUCING THE SAME, AND CROSSLINKED MOLDED ARTICLE AND COPPER-CLAD LAMINATE EACH OBTAINED THEREFROM ZEON CORPORATION (JP) 2010-01-21 US disclosed
EP-2067812-A1 MOLDED OBJECT, PROCESS FOR PRODUCING THE SAME, AND CROSSLINKED MOLDING AND COPPER-CLAD LAMINATE EACH OBTAINED FROM THE SAME ZEON CORPORATION (JP) 2009-06-10 EP disclosed
US-20090036614-A1 METHOD OF MANUFACTURING THERMOPLASTIC RESIN, CROSSLINKED RESIN, AND CROSSLINKED RESIN COMPOSITE MATERIAL ZEON CORPORATION 2009-02-05 US disclosed
US-7476716-B2 Method of manufacturing thermoplastic resin, crosslinked resin, and crosslinked resin composite material ZEON CORPORATION (JP) 2009-01-13 US disclosed
US-20080206676-A1 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS, U.S.A, INC 2008-08-28 US disclosed
WO-2008103776-A2 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-08-28 WO disclosed
US-7381782-B2 Polymerizable composition and molded articles produced by using the same ZEON CORPORATION (JP) 2008-06-03 US disclosed
EP-1535941-B1 PROCESSES FOR PRODUCING THERMOPLASTIC RESINS, CROSSLINKED RESINS AND CROSSLINKED RESIN COMPOSITE MATERIALS ZEON CORP (JP) 2007-09-12 EP disclosed
US-20070191563-A1 Method of manufacturing thermoplastic resin, crosslinked resin, and crosslinked resin composite material ZEON CORPORATION (JP) 2007-08-16 US disclosed
US-20060258828-A1 Polymerizable composition and molded articles produced by using the same ZEON CORPORATION (JP) 2006-11-16 US disclosed
US-20060211834-A1 Method of manufacturing thermoplastic resin, crosslinked resin, and crosslinked resin composite material ZEON CORPORATION (JP) 2006-09-21 US disclosed
EP-1655321-A1 POLYMERIZABLE COMPOSITIONS AND MOLDED ARTICLES PRODUCED BY USING THE SAME Zeon Corporation (JP) 2006-05-10 EP disclosed
EP-1535941-A1 PROCESSES FOR PRODUCING THERMOPLASTIC RESINS, CROSSLINKED RESINS AND CROSSLINKED RESIN COMPOSITE MATERIALS ZEON CORPORATION (JP) 2005-06-01 EP disclosed
US-6372854-B1 POLYALKENAMERS USED AS PHOTORESISTS HAVING EXCELLENT OPTICAL ELECTRICAL PROPERTIES; HIGH RIGIDITY; HEAT RESISTANCE; ADHESION AND WEAR RESISTANCE; HYDROGENATION; ACIDOLYSIS MITSUI CHEMICALS, INC. (JP) 2002-04-16 US disclosed