SCHEMBL10899747

SCHEMBL10899747

C=Cc1ccccc1/C=C(/C(=O)O)[N+](=O)[O-]

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.41
▸ KMT2A Q03164 4/20 0.41
▸ GAA P10253 2/20 0.41
▸ KDM4E B2RXH2 2/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ MEN1 O00255 3/20 0.40
▸ HPGD P15428 2/20 0.40
▸ FBP1 P09467 3/20 0.39
▸ MAPT P10636 3/20 0.39
▸ SMN1; SMN2 Q16637 2/20 0.38
▸ LMNA P02545 1/20 0.38
▸ PRMT1 Q99873 1/20 0.38
▸ NPSR1 Q6W5P4 1/20 0.36
▸ MAOB P27338 1/20 0.36
▸ CYP1A2 P05177 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ NPC1 O15118 1/20 0.33
▸ NFKB1 P19838 1/20 0.33
▸ RAB9A P51151 1/20 0.33
▸ NFKB2 Q00653 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28639439 0.85 KMT2A (0.45) ALDH1A1KMT2AGAAKDM4EL3MBTL1
SCHEMBL11140787 0.77 FBP1 (0.58) FBP1MAPTSMN1; SMN2PRMT1
SCHEMBL42324 0.77 FBP1 (0.58) FBP1MAPTSMN1; SMN2PRMT1
SCHEMBL6382677 0.77 FBP1 (0.58) FBP1MAPTSMN1; SMN2PRMT1
Hydrochloric Acid SCHEMBL4989759 0.75 FBP1 (0.56) FBP1MAPTSMN1; SMN2PRMT1
SCHEMBL27897016 0.75 FBP1 (0.56) FBP1MAPTSMN1; SMN2PRMT1
SCHEMBL27883556 0.75 FBP1 (0.56) FBP1MAPTSMN1; SMN2PRMT1
SCHEMBL27867388 0.75 FBP1 (0.56) FBP1MAPTSMN1; SMN2PRMT1
SCHEMBL11117431 0.74 PTGS2 (0.43) FBP1PRMT1
SCHEMBL28127299 0.73 ALDH1A1 (0.46) ALDH1A1KMT2AMEN1FBP1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4591544-A Metal image forming materials with light sensitive resin layer and oblique angle deposited metal underlayer KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1986-05-27 — — US disclosed
EP-0082588-A2 Photolithographic elements for the production of metal images KONICA CORPORATION (JP) 1983-06-29 — — EP disclosed
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