Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | THRB | P10828 | 3/20 | 0.46 |
| ▸ | GAA | P10253 | 3/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.46 |
| ▸ | RECQL | P46063 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | PLEC | Q15149 | 1/20 | 0.43 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.42 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.42 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.42 |
| ▸ | MTOR | P42345 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.40 |
| ▸ | CNR1 | P21554 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | MAOA | P21397 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL801356 | 0.88 | SMN1; SMN2 (0.53) | MAPTGAAL3MBTL1KDM4ENPSR1 | |
| SCHEMBL801355 | 0.87 | EPHX2 (0.48) | MAPTGAAMEN1KMT2ANPSR1 | |
| SCHEMBL13223590 | 0.86 | EPHX1 (0.47) | GAAL3MBTL1MEN1KMT2ANPSR1 | |
| SCHEMBL12338026 | 0.85 | MAPT (0.43) | MAPTTHRBGAAL3MBTL1RECQL | |
| SCHEMBL2742140 | 0.85 | EPHX2 (0.49) | MAPTGAANPSR1EPHX2ALDH1A1 | |
| SCHEMBL13667501 | 0.84 | CA2 (0.60) | L3MBTL1MEN1KMT2AKDM4E | |
| SCHEMBL12126301 | 0.81 | EPHX2 (0.45) | MAPTMEN1KMT2ASMN1; SMN2EPHX2 | |
| SCHEMBL13667487 | 0.81 | ALDH1A1 (0.57) | MAPTGAAKMT2AKDM4ENPSR1 | |
| SCHEMBL12755474 | 0.81 | HDAC1 (0.38) | MAPTGAAMEN1KMT2ATP53 | |
| SCHEMBL13256667 | 0.80 | KDM4E (0.50) | L3MBTL1MEN1KMT2AKDM4ESMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-9034560-B2 | Negative resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-20140227642-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2014-08-14 | — | — | US | disclosed |
| US-8637220-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-01-28 | — | — | US | disclosed |
| US-8637222-B2 | Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern | FUJIFILM CORPORATION (JP) | 2014-01-28 | — | — | US | disclosed |
| US-20130004897-A1 | METHOD FOR MANUFACTURING A PLANOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2013-01-03 | — | — | US | disclosed |
| US-8283107-B2 | Imageable elements and methods useful for providing waterless printing plates | EASTMAN KODAK COMPANY (US) | 2012-10-09 | — | — | US | disclosed |
| US-8263307-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-09-11 | — | — | US | disclosed |
| US-8151705-B2 | Method of preparing lithographic printing plate | FUJIFILM CORPORATION (JP) | 2012-04-10 | — | — | US | disclosed |
| US-20120003583-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20100081771-A1 | METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| US-20090305162-A1 | IMAGEABLE ELEMENTS AND METHODS USEFUL FOR PROVIDING WATERLESS PRINTING PLATES | FAR EAST DEVELOPMENT LTD. | 2009-12-10 | — | — | US | disclosed |
| US-20090269701-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090246693-A1 | NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF LITHOGRAPHIC PRINTING USING SAME | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| US-7521168-B2 | Compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation. | FUJIFILM CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-7507525-B2 | Polymerizable composition and lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2009-03-24 | — | — | US | disclosed |
| US-7432034-B2 | Negative resist composition | FUJIFILM CORPORATION (JP) | 2008-10-07 | — | — | US | disclosed |
| US-20080241745-A1 | Mixture of alkali soluble polymer, crosslinking agent, acid generator ; radiation with actinic radiation; quaternary ammonium compound | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-7279539-B2 | Alkali-soluble polymer and polymerizable composition thereof | FUJIFILM CORPORATION (JP) | 2007-10-09 | — | — | US | disclosed |
| US-7163777-B2 | Thermally imagable article comprising substrate coated with positive working heat-sensitive, hydroxyl group-containing polymer and a heat-labile moiety which decreases developer solubility; free of acid generators | EASTMAN KODAK COMPANY (US) | 2007-01-16 | — | — | US | disclosed |