Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.62 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.50 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.50 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.49 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.49 |
| ▸ | HTR1A | P08908 | 1/20 | 0.49 |
| ▸ | SCN1A | P35498 | 1/20 | 0.49 |
| ▸ | SCN5A | Q14524 | 1/20 | 0.49 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.49 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.49 |
| ▸ | PKM | P14618 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | ESR1 | P03372 | 1/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL117002 | 0.95 | LMNA (0.57) | LMNATDP1MAPK1HIF1ACYP2D6 | |
| SCHEMBL14827300 | 0.91 | LMNA (0.51) | LMNATDP1ESR1ESR2TSHR | |
| SCHEMBL12126258 | 0.89 | MAPT (0.49) | LMNATDP1MAPK1CYP2D6CYP1A2 | |
| SCHEMBL2742139 | 0.86 | ESR1 (0.63) | LMNATDP1MAPK1CYP2D6CYP1A2 | |
| SCHEMBL12126280 | 0.84 | LMNA (0.44) | LMNATDP1MAPK1ESR1ESR2 | |
| SCHEMBL24832353 | 0.84 | MAPK1 (0.56) | LMNATDP1MAPK1HIF1ACYP2D6 | |
| SCHEMBL13159647 | 0.84 | LMNA (0.54) | LMNATDP1MAPK1HIF1ACYP2D6 | |
| SCHEMBL751954 | 0.83 | ALDH1A1 (0.54) | LMNATDP1MAPK1HIF1ASCN1A | |
| SCHEMBL17933449 | 0.83 | HRH3 (0.53) | LMNAKMT2ASMN1; SMN2ADRB2ADRB1 | |
| SCHEMBL12934612 | 0.83 | L3MBTL1 (0.64) | LMNATDP1MAPK1CYP1A2CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10025011-B2 | Composition, infrared transmission filter and method for manufacturing the same, and infrared sensor | FUJIFILM CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-9810821-B2 | Infrared ray cutoff filter | FUJIFILM CORPORATION (JP) | 2017-11-07 | — | — | US | disclosed |
| US-9664827-B2 | Colored composition, method of producing color filter using the same, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-05-30 | — | — | US | disclosed |
| US-9625618-B2 | Optical member set and solid-state imaging element using the same | FUJIFILM CORPORATION (JP) | 2017-04-18 | — | — | US | disclosed |
| US-9519079-B2 | Coloring composition, colored pattern, color filter and method of producing the same, pattern forming method, solid-state imaging device, and image display device | FUJIFILM CORPORATION (JP) | 2016-12-13 | — | — | US | disclosed |
| US-9442373-B2 | Method of producing color filter and solid-state imaging device having colored composition containing color agent | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-9389507-B2 | Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition | FUJIFILM CORPORATION (JP) | 2016-07-12 | — | — | US | disclosed |
| US-9389505-B2 | Polymerizable composition for solder resist, and solder resist pattern formation method | FUJIFILM CORPORATION (JP) | 2016-07-12 | — | — | US | disclosed |
| US-9354514-B2 | Photosensitive transparent composition for color filter of solid-state imaging device, and production method of color filter of solid-state imaging device, color filter of solid-state imaging device, and solid-state imaging device, each using the same | FUJIFILM CORPORATION (JP) | 2016-05-31 | — | — | US | disclosed |
| US-20150293281-A1 | CURABLE RESIN COMPOSITION FOR FORMING INFRARED REFLECTIVE FILM, INFRARED REFLECTIVE FILM AND MANUFACTURING METHOD THEREOF, INFRARED RAY CUT-OFF FILTER, AND SOLID-STATE IMAGING DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| US-20120068292-A1 | POLYMERIZABLE COMPOSITION, AND PHOTOSENSITIVE LAYER, PERMANENT PATTERN, WAFER-LEVEL LENS, SOLID-STATE IMAGING DEVICE AND PATTERN FORMING METHOD EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20110134411-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR, LITHOGRAPHIC PRINTING METHOD AND PACKAGED BODY OF LITHOGRAPHIC PRINTING PLATE PRECURSORS | MITSUMOTO TOMOYOSHI | 2011-06-09 | — | — | US | disclosed |
| US-20110124824-A1 | DISPERSION COMPOSITION, POLYMERIZABLE COMPOSITION, LIGHT-SHIELDING COLOR FILTER, SOLID-STATE IMAGE PICK-UP ELEMENT, LIQUID CRYSTAL DISPLAY DEVICE, WAFER LEVEL LENS, AND IMAGE PICK-UP UNIT | FUJIFILM CORPORATION (JP) | 2011-05-26 | — | — | US | disclosed |
| US-7910286-B2 | Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors | FUJIFILM CORPORATION (JP) | 2011-03-22 | — | — | US | disclosed |
| US-7858291-B2 | imagewise exposure, protective layer comprises water-soluble polyvinyl alcohol; phosphonium salts | FUJIFILM CORPORATION (JP) | 2010-12-28 | — | — | US | disclosed |
| US-20100279230-A1 | PRODUCTION METHOD OF LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD | MITSUMOTO TOMOYOSHI | 2010-11-04 | — | — | US | disclosed |
| US-7790352-B2 | Lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2010-09-07 | — | — | US | disclosed |
| US-7745090-B2 | Imagewise exposing printing plate precursor comprising a support,image recording layer andprotective layer; rubbing the plate surface by an automatic rubbing processor in the presence of a non-alkaline developerto remove the protective layer and the image recording layer in the unexposed area | FUJIFILM CORPORATION (JP) | 2010-06-29 | — | — | US | disclosed |
| US-7435532-B2 | Lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-20080227026-A1 | Lithographic printing plate precursor | ODA AKIO | 2008-09-18 | — | — | US | disclosed |