SCHEMBL11046216

SCHEMBL11046216

CCc1cccc(C(=O)c2ccc(N)c(CC)c2CC)c1CC

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 2/20 0.38
GABRB2 P47870 2/20 0.38
ALDH1A1 P00352 3/20 0.37
HSD17B10 Q99714 2/20 0.37
CLCN2 P51788 1/20 0.36
RECQL P46063 1/20 0.35
KDM4E B2RXH2 3/20 0.35
HPGD P15428 1/20 0.35
LMNA P02545 1/20 0.34
ALOX15 P16050 1/20 0.34
DHFR P00374 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10915002 0.86 GABRA1 (0.50) GABRA1GABRB2ALDH1A1CLCN2LMNA
SCHEMBL1673477 0.84 ALDH1A1 (0.46) ALDH1A1HSD17B10RECQLKDM4EHPGD
SCHEMBL11128772 0.84 ALDH1A1 (0.47) GABRA1GABRB2ALDH1A1HSD17B10KDM4E
SCHEMBL2001242 0.83 ALDH1A1 (0.44) GABRA1GABRB2ALDH1A1HSD17B10CLCN2
SCHEMBL11068431 0.80 MAPT (0.53) ALDH1A1HSD17B10KDM4EHPGDLMNA
SCHEMBL8743511 0.77 GABRP (0.49) GABRA1GABRB2ALDH1A1HSD17B10RECQL
SCHEMBL27656498 0.77 PARP1 (0.39) GABRA1GABRB2ALDH1A1HSD17B10KDM4E
Phthalic Acid SCHEMBL21957758 0.77 ALDH1A1 (0.47) GABRA1GABRB2ALDH1A1HSD17B10CLCN2
SCHEMBL28947561 0.77 LMNA (0.46) GABRA1GABRB2ALDH1A1KDM4EHPGD
SCHEMBL165995 0.76 GABRA1 (0.46) GABRA1GABRB2ALDH1A1HSD17B10KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4438245-A FOR LIGHT SENSITIVE ELEMENTS FUJI PHOTO FILM CO., LTD. (JP) 1984-03-20 US disclosed
US-4073968-A IRRADIATING A PHOTOCURABLE COMPOSITION FUJI PHOTO FILM CO., LTD. (JA) 1978-02-14 US disclosed
US-4065430-A Functional group containing polymer and method of preparing the same FUJI PHOTO FILM CO., LTD. (JA) 1977-12-27 US disclosed
US-4060685-A Furanacroyl esters FUJI PHOTO FILM CO., LTD. (JA) 1977-11-29 US disclosed
US-4041017-A Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams FUJI PHOTO FILM CO., LTD. (JA) 1977-08-09 US disclosed
US-3993624-A Light-sensitive high molecular weight compound capable of being cross-linked by irradiation with light or an electron beam FUJI PHOTO FILM CO., LTD. (JA) 1976-11-23 US disclosed
US-3945831-A Photosensitive resins containing a thienylacrylic acid ester or amide group FUJI PHOTO FILM CO., LTD. (JA) 1976-03-23 US disclosed
US-3936429-A Reactive polymer FUJI PHOTO FILM CO., LTD. (JA) 1976-02-03 US disclosed
US-3933885-A Cinnamylideneacetic acid esters FUJI PHOTO FILM CO., LTD. (JA) 1976-01-20 US disclosed
US-3931248-A Reactive high polymer compound FUJI PHOTO FILM CO., LTD. (JA) 1976-01-06 US disclosed