SCHEMBL11060025

SCHEMBL11060025

Cc1c(-c2ccccc2)ccc(N(C)C)c1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RXRA P19793 1/20 0.41
RXRB P28702 1/20 0.41
PDCD1 Q15116 1/20 0.41
CD274 Q9NZQ7 1/20 0.41
ESR2 Q92731 1/20 0.38
PGR P06401 1/20 0.38
PARP10 Q53GL7 1/20 0.38
PARP11 Q9NR21 1/20 0.38
PSMB5 P28074 1/20 0.37
CYP2A6 P11509 1/20 0.36
CYP2B6 P20813 1/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
ADORA2A P29274 1/20 0.36
CHEK1 O14757 1/20 0.35
NEK2 P51955 1/20 0.35
LIMK1 P53667 1/20 0.35
DYRK1A Q13627 1/20 0.35
CLK4 Q9HAZ1 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19018491 0.83 PDCD1 (0.50) PDCD1CD274PGRPSMB5CYP2A6
SCHEMBL9792869 0.82 PDCD1 (0.54) PDCD1CD274ESR2PARP10PARP11
Hydrogen Peroxide SCHEMBL623863 0.81 RXRA (0.38) RXRARXRBPDCD1CD274KMT2A
SCHEMBL21548 0.80 CYP3A4 (0.40) RXRARXRBMEN1KMT2ACHEK1
SCHEMBL27687136 0.80 CYP3A4 (0.40) RXRARXRBMEN1KMT2ACHEK1
SCHEMBL11060977 0.80 RXRA (0.40) RXRARXRBPDCD1CD274ESR2
Hydrochloric Acid SCHEMBL526312 0.79 TDP1 (0.39) RXRARXRBKMT2ACHEK1NEK2
Hydrochloric Acid SCHEMBL1074845 0.79 TDP1 (0.39) RXRARXRBKMT2ACHEK1NEK2
Benzidine SCHEMBL4523874 0.79 CYP3A4 (0.41) RXRARXRBMEN1KMT2ASMN1; SMN2
SCHEMBL3220425 0.79 CYP3A4 (0.39) RXRARXRBKMT2ACHEK1NEK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4473709-A Pyrethroid intermediates and process FMC CORPORATION (US) 1984-09-25 US claimed
CN-110268291-B Curable resin composition for polarizing film, and method for producing same 日东电工株式会社 2022-03-08 CN disclosed
US-4473709-A Pyrethroid intermediates and process FMC CORPORATION (US) 1984-09-25 US disclosed