SCHEMBL1115744

SCHEMBL1115744

OCCC(O)CC(O)CO

nearest known ligand 0.71

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.71
LMNA P02545 2/20 0.47
ALDH1A1 P00352 1/20 0.47
USP2 O75604 2/20 0.46
CYP3A4 P08684 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14747621 1.00 THRB (0.71) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL13806112 1.00 THRB (0.71) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL9301671 0.91 THRB (0.77) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL1888683 0.90 THRB (0.62) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL25949401 0.90 THRB (0.62) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL13569224 0.87 THRB (0.59) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL14388243 0.87 THRB (0.59) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL8721132 0.87 THRB (0.59) THRBLMNAALDH1A1USP2CYP3A4
Ethylene Glycol SCHEMBL2828260 0.83 LMNA (0.57) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL705919 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4621488-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME Ycchem Co., Ltd. (KR) 2025-09-24 EP claimed
US-20250236813-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME YCCHEM CO., LTD. (KR) 2025-07-24 US claimed
CN-120019333-A Flushing liquid composition for extreme ultraviolet lithography and pattern forming method using same YC化学制品株式会社 2025-05-16 CN claimed
WO-2024106711-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME 와이씨켐 주식회사 2024-05-23 WO claimed
US-20230266672-A1 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME YOUNG CHANG CHEMICAL CO., LTD (KR) 2023-08-24 US claimed
EP-4212958-A1 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME Young Chang Chemical Co., Ltd. (KR) 2023-07-19 EP claimed
US-20220342313-A1 PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME YOUNG CHANG CHEMICAL CO., LTD (KR) 2022-10-27 US claimed
EP-4036648-A1 PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME Young Chang Chemical Co., Ltd. (KR) 2022-08-03 EP claimed
CN-114450640-A Process liquid composition for lithography and pattern formation method using the same 荣昌化学制品株式会社 2022-05-06 CN claimed
CN-114258410-A Improved method for recycling polyurethane materials 雷克蒂塞尔公司 2022-03-29 CN claimed
WO-2022055128-A1 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME 영창케미칼 주식회사 2022-03-17 WO claimed
WO-2021060672-A1 PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME 영창케미칼 주식회사 2021-04-01 WO claimed
US-20090312485-A1 UNSATURATED POLYESTER RESIN COMPOSITIONS COMPRISING 1,3-PROPANEDIOL E. I. DUPONT DE NEMOURS AND COMPANY (US) 2009-12-17 US claimed
WO-2008057263-A2 PROCESSES FOR PURIFYING CRUDE POLYOL-CONTAINING COMPOSITIONS USING A SWEEP GAS CARGILL, INCORPORATED (US) 2008-05-15 WO claimed
EP-4621488-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME Ycchem Co., Ltd. (KR) 2025-09-24 EP disclosed
US-20250236813-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME YCCHEM CO., LTD. (KR) 2025-07-24 US disclosed
US-20250206939-A1 CURABLE SULFONATED POLYMER COMPOSITIONS NOTARK CORPORATION (US) 2025-06-26 US disclosed
US-5030550-A Containing a basic compound and a nonionic surfactant containing oxyethylene and oxypropylene groups FUJI PHOTO FILM CO., LTD. (JP) 1991-07-09 US disclosed
US-4952560-A USING MIXTURE WITH WATER-SOLUBLE PROTEINS, MONOHYDRIC ALCOHOLS AND ALKYLENE GLYCOL WETTING AGENTS FOR TRANSDERMAL DRUG DELIVERY TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1990-08-28 US disclosed
US-4868221-A Process for the production of methanol and a composition suitable for use as a catalyst in said process SHELL OIL COMPANY (US) 1989-09-19 US disclosed