Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | GLA | P06280 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | PAOX | Q6QHF9 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | KDM1A | O60341 | 4/20 | 0.39 |
| ▸ | SAT1 | P21673 | 3/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.37 |
| ▸ | ACHE | P22303 | 1/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA3 | P07451 | 1/20 | 0.34 |
| ▸ | CA4 | P22748 | 1/20 | 0.34 |
| ▸ | CA6 | P23280 | 1/20 | 0.34 |
| ▸ | CA5A | P35218 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL31441106 | 0.98 | CYP2C19 (0.44) | CYP2C19MEN1KMT2AGLACYP1A2 | |
| SCHEMBL110493 | 0.96 | PAOX (0.47) | CYP2C19MEN1KMT2AGLACYP1A2 | |
| SCHEMBL107894 | 0.94 | PAOX (0.46) | CYP2C19MEN1KMT2AGLACYP1A2 | |
| SCHEMBL111160 | 0.88 | TGFBR1 (0.34) | CYP2C19MEN1KMT2AGLACYP1A2 | |
| SCHEMBL632876 | 0.87 | KDM4E (0.46) | CYP2C19MEN1KMT2APAOXKDM4E | |
| SCHEMBL3278941 | 0.86 | PAOX (0.60) | CYP2C19MEN1KMT2AGLACYP1A2 | |
| SCHEMBL2556382 | 0.86 | PAOX (0.50) | CYP2C19CYP1A2PAOXKDM4ETSHR | |
| Diethylamine SCHEMBL2502248 | 0.86 | ACHE (0.46) | CYP2C19CYP1A2PAOXTSHRACHE | |
| SCHEMBL16309325 | 0.85 | KDM4E (0.44) | CYP2C19MEN1KMT2APAOXKDM4E | |
| SCHEMBL3280866 | 0.85 | PAOX (0.53) | PAOXTSHREPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 206 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524111-B2 | CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-09-03 | — | — | US | claimed |
| US-7700540-B2 | Hard surface cleaning composition | THE CLOROX COMPANY (US) | 2010-04-20 | — | — | US | claimed |
| US-20070099816-A1 | Hard Surface Cleaning Composition | THE CLOROX COMPANY | 2007-05-03 | — | — | US | claimed |
| EP-1720407-A1 | FORMULATION FOR SEED TREATMENT COMPRISING POLYMERIC STICKERS | BASF AKTIENGESELLSCHAFT (DE) | 2006-11-15 | — | — | EP | claimed |
| WO-2005077170-A1 | FORMULATION FOR SEED TREATMENT COMPRISING POLYMERIC STICKERS | BASF AKTIENGESELLSCHAFT (DE) | 2005-08-25 | — | — | WO | claimed |
| EP-3870656-B1 | ACRYLIC POLYMERS FOR INKJET INK APPLICATIONS | CABOT CORP (US) | 2026-03-18 | — | — | EP | disclosed |
| US-12018162-B2 | Acrylic polymers for inkjet ink applications | CABOT CORPORATION (US) | 2024-06-25 | — | — | US | disclosed |
| US-11976220-B2 | Polishing composition and method for producing same | FUJIMI INCORPORATED (JP) | 2024-05-07 | — | — | US | disclosed |
| US-11913899-B2 | Sensor using particles coated with molecularly imprinted polymer | SHIBAURA INSTITUTE OF TECHNOLOGY (JP) | 2024-02-27 | — | — | US | disclosed |
| EP-4067999-B1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHINETSU CHEMICAL CO (JP) | 2023-10-04 | — | — | EP | disclosed |
| EP-4063954-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING POSITIVE PHOTOSENSITIVE DRY FILM, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHINETSU CHEMICAL CO (JP) | 2023-10-04 | — | — | EP | disclosed |
| US-20230073290-A1 | POLISHING COMPOSITION AND METHOD FOR PRODUCING SAME | FUJIMI INCORPORATED (JP) | 2023-03-09 | — | — | US | disclosed |
| US-4456633-A | Chip seal technique employing blends of asphaltic emulsions | OWENS-CORNING FIBERGLAS CORPORATION (US) | 1984-06-26 | — | — | US | disclosed |
| US-4436864-A | Aqueous emulsions of acrylamide and rubber modified asphalts | OWENS-CORNING FIBERGLAS CORPORATION (US) | 1984-03-13 | — | — | US | disclosed |
| US-4436767-A | Slurry seal method using acrylamide and rubber modified asphaltic emulsion | OWENS-CORNING FIBERGLAS CORPORATION (US) | 1984-03-13 | — | — | US | disclosed |
| US-4419489-A | Easily emulsifiable acrylamide and rubber modified asphalts | OWENS-CORNING FIBERGLAS CORPORATION (US) | 1983-12-06 | — | — | US | disclosed |
| US-4394481-A | Cationic arcylamide and rubber modified asphalts | OWENS-CORNING FIBERGLAS CORPORATION (US) | 1983-07-19 | — | — | US | disclosed |
| WO-1983002115-A1 | CATIONIC ACRYLAMIDE AND RUBBER MODIFIED ASPHALTS | OWENS CORNING FIBERGLASS CORP (US) | 1983-06-23 | — | — | WO | disclosed |
| EP-0082056-A1 | Cationic acrylamide and rubber modified asphalts | OWENS-CORNING FIBERGLAS CORPORATION (US) | 1983-06-22 | — | — | EP | disclosed |
| US-4383081-A | Cationic acrylamide chemically modified asphalts | OWENS-CORNING FIBERGLAS CORPORATION (US) | 1983-05-10 | — | — | US | disclosed |