SCHEMBL11249907

SCHEMBL11249907

CN1CCN(C)C1=Nc1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.43
GAA P10253 2/20 0.43
MAPK1 P28482 1/20 0.43
HTT P42858 1/20 0.43
LMNA P02545 2/20 0.40
TTR P02766 1/20 0.38
MEN1 O00255 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
KMT2A Q03164 1/20 0.38
L3MBTL1 Q9Y468 2/20 0.36
ATM Q13315 1/20 0.36
ALDH1A1 P00352 3/20 0.36
GSK3B P49841 2/20 0.36
PDE4D Q08499 1/20 0.36
PDE7A Q13946 1/20 0.36
POLB P06746 1/20 0.35
DRD2 P14416 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4100615 0.91 LMNA (0.41) MAPTGAAMAPK1HTTLMNA
SCHEMBL5748390 0.79 PABPC1 (0.39) MAPTGAAMAPK1MEN1CYP3A4
SCHEMBL8608078 0.78 GAA (0.41) MAPTGAAHTTLMNACYP1A2
SCHEMBL17386514 0.77 ALDH1A1 (0.37) MAPTGAAMAPK1LMNAMEN1
SCHEMBL14368033 0.74 AURKA (0.43) MAPTMAPK1HTTLMNAMEN1
SCHEMBL11340269 0.74 LMNA (0.53) MAPTGAAMAPK1HTTLMNA
SCHEMBL11340270 0.74 LMNA (0.53) MAPTGAAMAPK1HTTLMNA
SCHEMBL9060055 0.72 CNR2 (0.40) DRD2SIGMAR1
SCHEMBL31554228 0.72 PMM2 (0.39) GAAMAPK1MEN1CYP3A4KMT2A
SCHEMBL8670784 0.71 ALDH1A1 (0.53) MAPTGAAMAPK1HTTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11787965-B2 Ink composition for forming an organic layer of a semiconductor NOVALED GMBH (DE) 2023-10-17 US disclosed
US-11787965-B2 Ink composition for forming an organic layer of a semiconductor NOVALED GMBH (DE) 2023-10-17 US disclosed
EP-3382770-B1 INK COMPOSITION FOR FORMING AN ORGANIC LAYER OF A SEMICONDUCTOR NOVALED GMBH (DE) 2023-09-20 EP disclosed
US-20200032093-A1 Ink Composition for Forming an Organic Layer of a Semiconductor NOVALED GMBH (DE) 2020-01-30 US disclosed
EP-0001663-B1 NOVEL 2-ARYLAMINO-HEXAHYDROPYRIMIDINES AND -IMIDAZOLIDINES, SALTS AND COMPLEXES THEREOF, METHOD OF PREPARING THE NOVEL COMPOUNDS AND FUNGICIDAL COMPOSITIONS WHICH CONTAIN THE NOVEL COMPOUNDS DUPHAR INTERNATIONAL RESEARCH B.V (NL) 1982-05-12 EP disclosed