Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KEAP1 | Q14145 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.36 |
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1098265 | 0.93 | KEAP1 (0.50) | KEAP1SMN1; SMN2SIGMAR1ALOX15ACE2 | |
| SCHEMBL479863 | 0.84 | ALOX15 (0.57) | KEAP1SMN1; SMN2SIGMAR1ALOX15ACE2 | |
| Hydrochloric Acid SCHEMBL22119678 | 0.82 | ALOX15 (0.55) | KEAP1SMN1; SMN2SIGMAR1ALOX15ACE2 | |
| SCHEMBL5564599 | 0.78 | HRH3 (0.36) | HRH3MEN1KMT2A | |
| SCHEMBL12550619 | 0.78 | GNAO1 (0.48) | SIGMAR1MEN1KMT2A | |
| SCHEMBL2850740 | 0.78 | PAOX (0.37) | SMN1; SMN2HRH3MEN1KMT2A | |
| SCHEMBL4666999 | 0.78 | — | — | |
| SCHEMBL1615517 | 0.78 | ALOX15 (0.61) | KEAP1SMN1; SMN2SIGMAR1ALOX15HRH3 | |
| SCHEMBL12551015 | 0.78 | ACE2 (0.67) | KEAP1SMN1; SMN2SIGMAR1ALOX15ACE2 | |
| SCHEMBL1097457 | 0.77 | KMT2A (0.37) | SMN1; SMN2HRH3MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8828641-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-09 | — | — | US | disclosed |
| US-8828641-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-09 | — | — | US | disclosed |
| US-20110129777-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-06-02 | — | — | US | disclosed |
| US-20110129777-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-06-02 | — | — | US | disclosed |
| US-4328223-A | 2-Amino-3a,4,5,6-tetrahydro-perimidine derivatives and their medicinal use in combatting circulatory diseases | BAYER AKTIENGESELLSCHAFT (DE) | 1982-05-04 | — | — | US | disclosed |
| US-4187306-A | Benzodiazepine-diones, a process for their production and their use as medicaments | BAYER AKTIENGESELLSCHAFT (DE) | 1980-02-05 | — | — | US | disclosed |