SCHEMBL1127496

SCHEMBL1127496

[c]1c(Sc2ccccc2)ccc2ccccc12

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.39
HTT P42858 1/20 0.39
MAPT P10636 2/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
MGLL Q99685 1/20 0.32
HSD17B10 Q99714 1/20 0.32
SIRT1 Q96EB6 1/20 0.32
MAOA P21397 1/20 0.31
MAOB P27338 1/20 0.31
KDM4E B2RXH2 1/20 0.31
NSD2 O96028 1/20 0.31
MAPK1 P28482 1/20 0.31
DHFR P00374 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1127924 0.83 HPGD (0.36) HPGDHTTHSD17B10
SCHEMBL6416569 0.76 IFNAR1 (0.41) HPGDMAPTSMN1; SMN2HSD17B10SIRT1
SCHEMBL2460073 0.75 CYP1A2 (0.31)
SCHEMBL4448073 0.73 HPGD (0.42) HPGDHTTMAPTSMN1; SMN2MGLL
SCHEMBL2464471 0.71 ELANE (0.33) HTTKDM4E
SCHEMBL2456769 0.71
SCHEMBL17288504 0.71
SCHEMBL2460977 0.71 POLB (0.33)
SCHEMBL239122 0.66 CYP2A6 (0.37) HPGDHSD17B10
SCHEMBL4449796 0.66 MAOA (0.40) HPGDHTTMAPTSMN1; SMN2MGLL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4675316-A FUNGICIDES ROHM AND HAAS COMPANY (US) 1987-06-23 US claimed
US-20240045330-A1 NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2024-02-08 US disclosed
CN-117420731-A Negative photosensitive composition and pattern forming method 东京应化工业株式会社 2024-01-19 CN disclosed
CN-113286781-B Sulfonium salt, photoacid generator, curable composition, and resist composition 三亚普罗股份有限公司 2023-08-08 CN disclosed
US-20230236505-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM SAN-APRO LTD. (JP) 2023-07-27 US disclosed
CN-116018558-A Negative photosensitive resin composition, pattern forming method and laminated film 三亚普罗股份有限公司 2023-04-25 CN disclosed
EP-3909943-A1 SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION San-Apro Ltd. (JP) 2021-11-17 EP disclosed
WO-2020145043-A1 SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION サンアプロ株式会社 2020-07-16 WO disclosed
EP-2284165-B1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION SAN APRO LTD (JP) 2013-02-20 EP disclosed
US-8278030-B2 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof SAN-APRO LIMITED (JP) 2012-10-02 US disclosed
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF SAN-APRO LIMITED (JP) 2011-02-17 US disclosed
EP-2284165-A1 PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION San-Apro Limited (JP) 2011-02-16 EP disclosed
US-4279720-A PHENYLGLYOXYLATE PHOTOINITIATOR WITH POLYALKYLPIPERIDINE STABILIZER CIBA-GEIGY CORPORATION (US) 1981-07-21 US disclosed
EP-0007059-B1 PHOTOCURABLE COMPOSITIONS CIBA-GEIGY AG (CH) 1981-04-15 EP disclosed
EP-0007059-A1 Photocurable compositions CIBA-GEIGY AG (CH) 1980-01-23 EP disclosed
US-4046656-A Photochlorination process for methyl aromatic compounds THE DOW CHEMICAL COMPANY (US) 1977-09-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF ARSA, ASIC1, TST HPGD 3810/4885HTT 2550/4885MAPT 3867/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.