Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AGXT | P21549 | 2/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | ALOX5 | P09917 | 3/20 | 0.42 |
| ▸ | RAB9A | P51151 | 2/20 | 0.41 |
| ▸ | PTPN7 | P35236 | 1/20 | 0.41 |
| ▸ | DRD3 | P35462 | 1/20 | 0.40 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.40 |
| ▸ | PPARG | P37231 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.39 |
| ▸ | HTR3A | P46098 | 1/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29366776 | 1.00 | AGXT (0.45) | AGXTCYP1A2CYP2A6KDM4EMAPK1 | |
| SCHEMBL14091340 | 0.95 | AGXT (0.40) | AGXTCYP1A2CYP2A6KDM4EMAPK1 | |
| SCHEMBL29448188 | 0.94 | TSHR (0.38) | AGXTCYP1A2CYP2A6KDM4EMAPK1 | |
| SCHEMBL36312 | 0.94 | TSHR (0.38) | AGXTCYP1A2CYP2A6KDM4EMAPK1 | |
| SCHEMBL21089716 | 0.88 | TSHR (0.36) | AGXTCYP1A2KDM4EALOX5MEN1 | |
| SCHEMBL14087673 | 0.87 | TSHR (0.38) | CYP1A2KDM4EALOX5RAB9AMEN1 | |
| SCHEMBL36036 | 0.84 | TSHR (0.45) | KDM4EMAPK1ALOX5MEN1KMT2A | |
| SCHEMBL36226 | 0.84 | TSHR (0.40) | CYP1A2MAPK1TDP1HRH3MEN1 | |
| SCHEMBL21747579 | 0.83 | TSHR (0.32) | KDM4EALOX5TSHRSMN1; SMN2 | |
| SCHEMBL36030 | 0.82 | MEN1 (0.41) | TDP1MEN1KMT2ALMNATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4667537-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-12-24 | — | — | EP | disclosed |
| US-20250382500-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO LTD (JP) | 2025-12-18 | — | — | US | disclosed |
| EP-1964893-B2 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM CORP (JP) | 2021-11-24 | — | — | EP | disclosed |
| EP-3199520-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2019-12-25 | — | — | EP | disclosed |
| US-10059662-B2 | Sulfonium salt, photoacid generator, and photosensitive composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-08-28 | — | — | US | disclosed |
| EP-1964893-B1 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM CORP (JP) | 2018-01-24 | — | — | EP | disclosed |
| US-20170305848-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-26 | — | — | US | disclosed |
| EP-3199520-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2017-08-02 | — | — | EP | disclosed |
| EP-2284165-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | SAN APRO LTD (JP) | 2013-02-20 | — | — | EP | disclosed |
| US-8278030-B2 | Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof | SAN-APRO LIMITED (JP) | 2012-10-02 | — | — | US | disclosed |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | SAN-APRO LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| EP-2284165-A1 | PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | San-Apro Limited (JP) | 2011-02-16 | — | — | EP | disclosed |
| EP-1964893-A1 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM Corporation (JP) | 2008-09-03 | — | — | EP | disclosed |
| US-20080206527-A1 | INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND INK SET | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080206527-A1 | INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND INK SET | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1069120-B1 | Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound | TOAGOSEI CO LTD (JP) | 2003-08-13 | — | — | EP | disclosed |
| US-6469108-B2 | REACTING A DIHYDROXYNAPHTHALENE WITH 3-ALKYL-3-CHLOROMETHYLOXETANE OR 3-CHLOROMETHYLOXETANE IN PRESENCE OF ALKALI METAL HYDROXIDE, ALKALI METAL HYDRIDE OR ALKALI METAL | TOAGOSEI CO., LTD. (JP) | 2002-10-22 | — | — | US | disclosed |
| US-20020103330-A1 | Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound | TOAGOSEI CO., LTD. | 2002-08-01 | — | — | US | disclosed |
| US-6365760-B1 | BIS(3-ALKYLOXETAN-3-YL)-METHOXY)BIPHENYL COMPOUNDS USED AS OPTICAL MATERIALS; WORKABILITY; LOW VISCOSITY; HIGH REFRACTIVE INDEX; PHOTO AND THERMOCURING; | TOAGOSEI CO., LTD. (JP) | 2002-04-02 | — | — | US | disclosed |
| EP-1069120-A1 | Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound | TOAGOSEI CO., LTD. (JP) | 2001-01-17 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170305848-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | ARSA, SPIN1, ASIC1 | AGXT 2157/4885CYP1A2 1693/4885CYP2A6 1791/4885 |
| US-10059662-B2 | Sulfonium salt, photoacid generator, and photosensitive composition | ARSA, SPIN1, ASIC1 | AGXT 2157/4885CYP1A2 1693/4885CYP2A6 1791/4885 |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | ARSA, ASIC1, TST | AGXT 1313/4885CYP1A2 2434/4885CYP2A6 2346/4885 |
| US-20020103330-A1 | Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound | NDC1, BECN1, NUCB2 | AGXT 3850/4885CYP1A2 430/4885CYP2A6 765/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.