SCHEMBL1127627

SCHEMBL1127627

Oc1ccc(C[Se]Cc2ccccc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ FNTA P49354 1/20 0.54
▸ FNTB P49356 1/20 0.54
▸ LMNA P02545 2/20 0.48
▸ CYP1A2 P05177 1/20 0.48
▸ PTGS1 P23219 1/20 0.48
▸ SLC6A2 P23975 1/20 0.48
▸ CYP2C19 P33261 1/20 0.48
▸ PTGS2 P35354 1/20 0.48
▸ SLC6A3 Q01959 1/20 0.48
▸ HIF1A Q16665 1/20 0.48
▸ HDAC6 Q9UBN7 1/20 0.48
▸ ESR1 P03372 3/20 0.46
▸ ESR2 Q92731 2/20 0.46
▸ CA2 P00918 2/20 0.46
▸ CA12 O43570 1/20 0.46
▸ CA1 P00915 1/20 0.46
▸ GLA P06280 1/20 0.46
▸ CA3 P07451 1/20 0.46
▸ CA4 P22748 1/20 0.46
▸ CA9 Q16790 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1127579 0.84 CYP1A2 (0.52) CYP1A2SLC6A2CYP2C19CA2CA1
SCHEMBL3088081 0.82 CYP1A2 (0.50) CYP1A2SLC6A2CYP2C19CA2CA1
SCHEMBL87817 0.77 ESR1 (0.78) FNTAFNTBLMNACYP1A2PTGS1
SCHEMBL13371509 0.77 ESR1 (0.78) FNTAFNTBLMNACYP1A2PTGS1
SCHEMBL717373 0.77 ESR1 (0.78) FNTAFNTBSLC6A2CYP2C19ESR1
Cyanide SCHEMBL21808145 0.77 CYP1A1 (0.52) CYP1A2SLC6A2CA2CA1CA9
SCHEMBL4406066 0.77 CYP1A2 (0.46) CYP1A2SLC6A2CYP2C19CA2CA1
SCHEMBL1127628 0.77 FNTA (0.46) FNTAFNTBLMNAHIF1ACA2
SCHEMBL1127631 0.77 DPP4 (0.53) FNTAFNTBLMNAESR1ESR2
Phenol SCHEMBL8781143 0.75 ESR1 (0.74) FNTAFNTBLMNACYP1A2PTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023053877-A1 PHOTOACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE USING SAID RESIST COMPOSITION 東洋合成工業株式会社 2023-04-06 — — WO disclosed
US-20200259085-A1 TREATMENT LIQUID CONTAINING IONIC COMPOUND, ORGANIC ELECTRONIC ELEMENT, AND METHOD FOR PRODUCING ORGANIC ELECTRONIC ELEMENT HITACHI CHEMICAL COMPANY, LTD. 2020-08-13 — — US disclosed
CN-106939074-B Treatment liquid containing ionic compound 日立化成株式会社 2020-06-16 — — CN disclosed
US-10665786-B2 Treatment liquid containing ionic compound, organic electronic element, and method for producing organic electronic element HITACHI CHEMICAL COMPANY, LTD. (JP) 2020-05-26 — — US disclosed
US-20200143954-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE HITACHI CHEMICAL COMPANY, LTD. (JP) 2020-05-07 — — US disclosed
US-10566105-B2 Method for producing charge transport film HITACHI CHEMICAL COMPANY, LTD. (JP) 2020-02-18 — — US disclosed
CN-110003447-A Treatment fluid, organic electronic element, light-emitting component, display element, lighting device, display device and organic photoelectric converter 日立化成株式会社 2019-07-12 — — CN disclosed
US-10273389-B2 Resin composition DENKA COMPANY LIMITED (JP) 2019-04-30 — — US disclosed
CN-105027677-B Treatment liquid containing ionic compound, organic electronic device, and method for producing organic electronic device 日立化成株式会社 2018-05-25 — — CN disclosed
CN-104487474-B Resin composition 电化株式会社 2018-01-12 — — CN disclosed
EP-2284165-B1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION SAN APRO LTD (JP) 2013-02-20 — — EP disclosed
US-20130037753-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE HITACHI CHEMICAL COMPANY, LTD (JP) 2013-02-14 — — US disclosed
US-8278030-B2 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof SAN-APRO LIMITED (JP) 2012-10-02 — — US disclosed
EP-2485290-A1 MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE Hitachi Chemical Company, Ltd. (JP) 2012-08-08 — — EP disclosed
US-20120181530-A1 MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE RESONAC CORPORATION (JP) 2012-07-19 — — US disclosed
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF SAN-APRO LIMITED (JP) 2011-02-17 — — US disclosed
EP-2284165-A1 PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION San-Apro Limited (JP) 2011-02-16 — — EP disclosed
US-7709598-B2 Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex SAN-APRO LIMITED (JP) 2010-05-04 — — US disclosed
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex SAN-APRO LIMITED (JP) 2007-09-27 — — US disclosed
EP-1752463-A1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX San-Apro Limited (JP) 2007-02-14 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130037753-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE L1CAM, CD99, EPB41L2 FNTA 4658/4885FNTB 4697/4885LMNA 3265/4885
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF ARSA, ASIC1, TST FNTA 4766/4885FNTB 4314/4885LMNA 3096/4885
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex AS3MT, TTR, PFAS FNTA 307/4885FNTB 136/4885LMNA 829/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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