Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 3/20 | 0.57 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.57 |
| ▸ | BLM | P54132 | 1/20 | 0.57 |
| ▸ | TSHR | P16473 | 1/20 | 0.54 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.54 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.48 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | CHRNB2 | P17787 | 2/20 | 0.34 |
| ▸ | CHRNB4 | P30926 | 2/20 | 0.34 |
| ▸ | CHRNA3 | P32297 | 2/20 | 0.34 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.34 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.34 |
| ▸ | HTT | P42858 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2954430 | 0.97 | ACHE (0.56) | ACHESMN1; SMN2BLMTSHROPRM1 | |
| SCHEMBL7553904 | 0.95 | ACHE (0.54) | ACHESMN1; SMN2BLMTSHROPRM1 | |
| Water SCHEMBL7548761 | 0.95 | ACHE (0.54) | ACHESMN1; SMN2BLMTSHROPRM1 | |
| SCHEMBL7553902 | 0.95 | ACHE (0.54) | ACHESMN1; SMN2BLMTSHROPRM1 | |
| Bromide SCHEMBL3881994 | 0.95 | ACHE (0.57) | ACHESMN1; SMN2BLMTSHROPRM1 | |
| Fluoride Ion SCHEMBL7548962 | 0.95 | ACHE (0.54) | ACHESMN1; SMN2BLMTSHROPRM1 | |
| Bromide SCHEMBL2575147 | 0.92 | ACHE (0.55) | ACHESMN1; SMN2BLMTSHROPRM1 | |
| Bromide SCHEMBL2575151 | 0.92 | ACHE (0.55) | ACHESMN1; SMN2BLMTSHROPRM1 | |
| SCHEMBL11569379 | 0.90 | ACHE (0.50) | ACHESMN1; SMN2BLMTSHROPRM1 | |
| Bromide SCHEMBL2575150 | 0.88 | ACHE (0.52) | ACHESMN1; SMN2BLMTSHROPRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2683792-B1 | NOVEL ETCHING COMPOSITION | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-09-25 | — | — | EP | disclosed |
| EP-2807289-B1 | ETCHING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS (US) | 2016-09-21 | — | — | EP | disclosed |
| US-9200372-B2 | Passivation composition and process | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-12-01 | — | — | US | disclosed |
| EP-2807289-A1 | ETCHING COMPOSITION | FujiFilm Electronic Materials USA, Inc. (US) | 2014-12-03 | — | — | EP | disclosed |
| US-8889025-B2 | Etching composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-20140120734-A1 | Novel Etching Composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2014-05-01 | — | — | US | disclosed |
| US-8709277-B2 | Etching composition | FUJIFILM CORPORATION (JP) | 2014-04-29 | — | — | US | disclosed |
| US-20140073140-A1 | Etching Composition | FUJIFILM CORPORATION (JP) | 2014-03-13 | — | — | US | disclosed |
| WO-2014039186-A1 | ETCHING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2014-03-13 | — | — | WO | disclosed |
| US-8647523-B2 | Etching composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2014-02-11 | — | — | US | disclosed |
| EP-2683792-A1 | NOVEL ETCHING COMPOSITION | FujiFilm Electronic Materials USA, Inc. (US) | 2014-01-15 | — | — | EP | disclosed |
| US-20130122701-A1 | Novel Passivation Composition and Process | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2013-05-16 | — | — | US | disclosed |
| WO-2013059806-A1 | Novel Passivation Composition and Process | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2013-04-25 | — | — | WO | disclosed |
| WO-2012125401-A1 | NOVEL ETCHING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2012-09-20 | — | — | WO | disclosed |
| US-20120231632-A1 | Novel Etching Composition | FUJIFILM CORPORATION (JP) | 2012-09-13 | — | — | US | disclosed |
| EP-0004606-B1 | PROCESS FOR PREPARING ANILINE COMPOUNDS | ETHYL CORPORATION (US) | 1982-03-10 | — | — | EP | disclosed |
| US-4186147-A | DISPLACEMENT OF THIOCYANOANILINE WITH AN ALCOHOL TO FORM THIOALKYL ANILINE | ETHYL CORPORATION (US) | 1980-01-29 | — | — | US | disclosed |
| EP-0004606-A2 | Process for preparing aniline compounds | ETHYL CORPORATION (US) | 1979-10-17 | — | — | EP | disclosed |