Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TUBB4A | P04350 | 1/20 | 0.49 |
| ▸ | TUBB | P07437 | 1/20 | 0.49 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.49 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.49 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.49 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.49 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.49 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.49 |
| ▸ | TUBB8 | Q3ZCM7 | 1/20 | 0.49 |
| ▸ | TUBA3E | Q6PEY2 | 1/20 | 0.49 |
| ▸ | TUBA1A | Q71U36 | 1/20 | 0.49 |
| ▸ | TUBA1C | Q9BQE3 | 1/20 | 0.49 |
| ▸ | TUBB6 | Q9BUF5 | 1/20 | 0.49 |
| ▸ | TUBB2B | Q9BVA1 | 1/20 | 0.49 |
| ▸ | TUBB1 | Q9H4B7 | 1/20 | 0.49 |
| ▸ | CYP1A1 | P04798 | 3/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.38 |
| ▸ | CYP1B1 | Q16678 | 3/20 | 0.38 |
| ▸ | NPC1 | O15118 | 5/20 | 0.36 |
| ▸ | MEN1 | O00255 | 4/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1130692 | 0.82 | CYP1A1 (0.47) | CYP1A1CYP1A2CYP1B1NPC1MEN1 | |
| SCHEMBL6230650 | 0.82 | CYP1A1 (0.47) | CYP1A1CYP1A2CYP1B1NPC1MEN1 | |
| SCHEMBL8653188 | 0.78 | LCK (0.51) | NPC1MEN1KMT2A | |
| SCHEMBL1130906 | 0.77 | RELA (0.54) | TUBB4ATUBBTUBA3CTUBA1BTUBA4A | |
| SCHEMBL20450511 | 0.77 | RELA (0.54) | TUBB4ATUBBTUBA3CTUBA1BTUBA4A | |
| SCHEMBL79976 | 0.76 | PDE5A (0.42) | NPC1MEN1KMT2ARAB9ASMN1; SMN2 | |
| SCHEMBL26432676 | 0.76 | PDE5A (0.42) | NPC1MEN1KMT2ARAB9ASMN1; SMN2 | |
| SCHEMBL79977 | 0.76 | PDE5A (0.42) | NPC1MEN1KMT2ARAB9ASMN1; SMN2 | |
| SCHEMBL1130756 | 0.73 | IDO1 (0.42) | CYP1A2NPC1RAB9AHTT | |
| SCHEMBL12595126 | 0.73 | ALDH1A1 (0.49) | NPC1MEN1MAPTKMT2ARAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200303086-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-09-24 | — | — | US | disclosed |
| US-10720259-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-07-21 | — | — | US | disclosed |
| US-10551745-B2 | Photopatternable compositions and methods of fabricating transistor devices using same | FLEXTERRA, INC. (US) | 2020-02-04 | — | — | US | disclosed |
| CN-110088680-A | The double-deck photosensitive layer volume | 旭化成株式会社 | 2019-08-02 | — | — | CN | disclosed |
| US-20170309363-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2017-10-26 | — | — | US | disclosed |
| US-20170227846-A1 | Photopatternable Compositions and Methods of Fabricating Transistor Devices Using Same | USINVEST LLC | 2017-08-10 | — | — | US | disclosed |
| US-20170102613-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HARDENED RELIEF PATTERN, SEMICONDUCTOR DEVICE AND DISPLAY DEVICE | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2017-04-13 | — | — | US | disclosed |
| US-9575410-B2 | Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2017-02-21 | — | — | US | disclosed |
| US-9029270-B2 | Phenolic resin composition, and methods for manufacturing cured relief pattern and semiconductor | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2015-05-12 | — | — | US | disclosed |
| US-20140349222-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HARDENED RELIEF PATTERN, SEMICONDUCTOR DEVICE AND DISPLAY DEVICE | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2014-11-27 | — | — | US | disclosed |
| US-20010044075-A1 | Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element | JSR CORPORATION (JP) | 2001-11-22 | — | — | US | disclosed |
| EP-1150165-A1 | Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element | JSR Corporation (JP) | 2001-10-31 | — | — | EP | disclosed |
| EP-0880075-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2001-10-17 | — | — | EP | disclosed |
| EP-1035439-A2 | Photosensitive resin composition, color filter, and copolymer resin useful for them | DAI NIPPON PRINTING CO., LTD. (JP) | 2000-09-13 | — | — | EP | disclosed |
| US-5958648-A | Radiation sensitive resin composition | JSR CORPORATION (JP) | 1999-09-28 | — | — | US | disclosed |
| US-5866298-A | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1999-02-02 | — | — | US | disclosed |
| EP-0880075-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1998-11-25 | — | — | EP | disclosed |
| EP-0775941-A1 | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-28 | — | — | EP | disclosed |
| EP-0594452-B1 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |