Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A1 | P04798 | 9/20 | 0.47 |
| ▸ | CYP1B1 | Q16678 | 9/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 8/20 | 0.47 |
| ▸ | CASP3 | P42574 | 1/20 | 0.42 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.42 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.42 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.42 |
| ▸ | FLT3 | P36888 | 7/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | RELA | Q04206 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6230650 | 1.00 | CYP1A1 (0.47) | CYP1A1CYP1B1CYP1A2CASP3SENP8 | |
| SCHEMBL1130384 | 0.82 | TUBB4A (0.49) | CYP1A1CYP1B1CYP1A2CASP3SENP8 | |
| SCHEMBL269261 | 0.81 | HRH4 (0.43) | CYP1A2KDM4ENPC1LMNAMAPT | |
| SCHEMBL269262 | 0.81 | HRH4 (0.43) | CYP1A2KDM4ENPC1LMNAMAPT | |
| SCHEMBL309120 | 0.80 | KDM4E (0.54) | CYP1A2CASP3SENP8SENP7SENP6 | |
| SCHEMBL2880789 | 0.80 | KDM4E (0.39) | CYP1A2KDM4EMEN1NPC1LMNA | |
| SCHEMBL309121 | 0.80 | KDM4E (0.54) | CYP1A2CASP3SENP8SENP7SENP6 | |
| SCHEMBL9625678 | 0.79 | CYP1A2 (0.42) | CYP1A2KDM4EMEN1NPC1LMNA | |
| SCHEMBL2879274 | 0.78 | APP (0.42) | CYP1A1CYP1B1CYP1A2FLT3KDM4E | |
| SCHEMBL14010594 | 0.78 | ALDH1A1 (0.38) | CYP1A2KDM4EMAPTSMN1; SMN2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115551915-B | Alkali-soluble resin containing polymerizable unsaturated group, process for producing the same, photosensitive resin composition, and cured product thereof | 日铁化学材料株式会社 | 2025-06-03 | — | — | CN | disclosed |
| CN-111748077-B | Alkali-soluble resin, hydrogenated compound, method for producing same, resin composition, cured film thereof, touch panel, and optical filter | 日铁化学材料株式会社 | 2025-04-18 | — | — | CN | disclosed |
| CN-112162462-B | Photosensitive resin composition for touch screen, cured film thereof, and touch screen having cured film thereof | 日铁化学材料株式会社 | 2025-04-08 | — | — | CN | disclosed |
| CN-110515268-B | Photosensitive resin composition, cured product of the same, and display device containing the cured product | 日铁化学材料株式会社 | 2024-12-06 | — | — | CN | disclosed |
| CN-112538157-B | Epoxy acrylate resin, alkali-soluble resin, process for producing the same, curable photosensitive resin composition, and cured product thereof | 日铁化学材料株式会社 | 2024-11-12 | — | — | CN | disclosed |
| CN-111103760-B | Photosensitive resin composition for partition wall, cured product, and method for producing partition wall | 日铁化学材料株式会社 | 2024-10-18 | — | — | CN | disclosed |
| CN-118732390-A | Photosensitive resin composition, cured film, substrate with cured film, and method for producing substrate with cured film | 日铁化学材料株式会社 | 2024-10-01 | — | — | CN | disclosed |
| WO-2024186169-A1 | ACRYLATE-BASED RESIN COMPOSITION AND PREPARATION METHOD THEREFOR | 국도화학 주식회사 | 2024-09-12 | — | — | WO | disclosed |
| CN-118530443-A | Unsaturated group-containing polymerizable resin, curable resin composition, laminate, and method for producing and treating laminate | 日铁化学材料株式会社 | 2024-08-23 | — | — | CN | disclosed |
| CN-118534725-A | Photosensitive resin composition and method for producing substrate with resin film | 日铁化学材料株式会社 | 2024-08-23 | — | — | CN | disclosed |
| US-5958648-A | Radiation sensitive resin composition | JSR CORPORATION (JP) | 1999-09-28 | — | — | US | disclosed |
| EP-0704765-B1 | A photoresist composition comprising a polyfunctional vinyl ether compound | SUMITOMO CHEMICAL CO (JP) | 1999-04-21 | — | — | EP | disclosed |
| US-5866298-A | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1999-02-02 | — | — | US | disclosed |
| EP-0880075-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1998-11-25 | — | — | EP | disclosed |
| US-5719008-A | PHOTOLITHOGRAPHY, COLOR FILTERS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-02-17 | — | — | US | disclosed |
| EP-0775941-A1 | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-28 | — | — | EP | disclosed |
| EP-0594452-B1 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0704765-A1 | A photoresist composition comprising a polyfunctional vinyl ether compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1996-04-03 | — | — | EP | disclosed |
| US-5432039-A | Radiation sensitive quinone diazide and resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-07-11 | — | — | US | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |