SCHEMBL1130405

SCHEMBL1130405

CCCCCC[B-](c1cccc(C(F)(F)F)c1)(c1cccc(C(F)(F)F)c1)c1cccc(C(F)(F)F)c1.c1ccc([I+]c2ccccc2)cc1

nearest known ligand 0.37

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TLR8 Q9NR97 1/20 0.37
DRD2 P14416 1/20 0.36
HDAC3 O15379 1/20 0.35
HDAC1 Q13547 1/20 0.35
HDAC2 Q92769 1/20 0.35
UBE2M P61081 3/20 0.35
DCUN1D1 Q96GG9 3/20 0.35
CNR2 P34972 2/20 0.34
ICMT O60725 1/20 0.34
KDM1A O60341 1/20 0.34
RCOR1 Q9UKL0 1/20 0.34
PTGDR2 Q9Y5Y4 2/20 0.34
SPHK2 Q9NRA0 1/20 0.33
SPHK1 Q9NYA1 1/20 0.33
CTSS P25774 1/20 0.33
CTSK P43235 1/20 0.33
TRPV1 Q8NER1 1/20 0.33
FAAH O00519 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1130723 0.91 LTB4R2 (0.38) CNR2FAAH
SCHEMBL26287035 0.91 TLR8 (0.40) TLR8HDAC3HDAC1HDAC2UBE2M
SCHEMBL6715464 0.89 TLR8 (0.42) TLR8DRD2HDAC3HDAC1HDAC2
SCHEMBL1130810 0.89 TLR8 (0.35) TLR8DRD2HDAC3HDAC1HDAC2
Biphenyl SCHEMBL7785983 0.88 TLR8 (0.41) TLR8HDAC3HDAC1HDAC2CNR2
SCHEMBL1130701 0.86 TLR8 (0.37) TLR8HDAC3HDAC1HDAC2UBE2M
Tetramethylammonium Ion SCHEMBL1130664 0.85 TLR8 (0.40) TLR8DRD2HDAC3HDAC1HDAC2
Tetramethylammonium Ion SCHEMBL29470085 0.85 TLR8 (0.40) TLR8DRD2HDAC3HDAC1HDAC2
Tetrabuthylammonium SCHEMBL1130718 0.83 TLR8 (0.39) TLR8DRD2HDAC3HDAC1HDAC2
SCHEMBL26287046 0.82 NFE2L2 (0.40) TLR8HDAC3HDAC1HDAC2ICMT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11450445-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2022-09-20 US disclosed
US-20200303086-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-09-24 US disclosed
US-10720259-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-07-21 US disclosed
US-20170309363-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2017-10-26 US disclosed
EP-1323742-B1 Radiation sensitive refractive index changing composition and refractive index changing method JSR CORP (JP) 2011-02-16 EP disclosed
EP-2012198-B1 METHOD AND EQUIPMENT FOR PROCESSING OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDER/REPRODUCER FUJIFILM CORP (JP) 2010-11-24 EP disclosed
US-20100061212-A1 METHOD AND DEVICE FOR OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDING AND REPRODUCING APPARATUS FUJIFILM CORPORATION (JP) 2010-03-11 US disclosed
EP-2012198-A1 METHOD AND EQUIPMENT FOR PROCESSING OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDER/REPRODUCER Fujifilm Corporation (JP) 2009-01-07 EP disclosed
US-7320854-B2 Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent JSR CORPORATION (JP) 2008-01-22 US disclosed
US-7205085-B2 Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern JSR CORPORATION (JP) 2007-04-17 US disclosed
US-20030187119-A1 Radiation-sensitive composition capable of having refractive index distribution JSR CORPORATION (JP) 2003-10-02 US disclosed
US-20030171468-A1 Radiation-sensitive composition changing in refractive index and utilization thereof JSR CORPORATION (JP) 2003-09-11 US disclosed
EP-1331518-A2 Radiation sensitive composition for forming an insulating film, insulating film and display device JSR Corporation (JP) 2003-07-30 EP disclosed
US-20030139486-A1 Radiation sensitive refractive index changing composition and refractive index changing method JSR CORPORATION (JP) 2003-07-24 US disclosed
EP-1323742-A2 Radiation sensitive refractive index changing composition and refractive index changing method JSR Corporation (JP) 2003-07-02 EP disclosed
US-20030064303-A1 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern JSR CORPORATION (JP) 2003-04-03 US disclosed
EP-1235104-A1 COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN JSR Corporation (JP) 2002-08-28 EP disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed