SCHEMBL1130701

SCHEMBL1130701

CCCCCC[B-](c1cccc(C(F)(F)F)c1)(c1cccc(C(F)(F)F)c1)c1cccc(C(F)(F)F)c1.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TLR8 Q9NR97 1/20 0.37
HDAC3 O15379 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC2 Q92769 1/20 0.36
CNR2 P34972 2/20 0.35
ICMT O60725 1/20 0.35
CTSS P25774 1/20 0.34
CTSK P43235 1/20 0.34
TRPV1 Q8NER1 1/20 0.34
SPHK2 Q9NRA0 1/20 0.34
SPHK1 Q9NYA1 1/20 0.34
ALDH1A1 P00352 2/20 0.33
UBE2M P61081 1/20 0.33
DCUN1D1 Q96GG9 1/20 0.33
POLB P06746 1/20 0.33
RXFP1 Q9HBX9 1/20 0.33
TSHR P16473 2/20 0.33
EPHX1 P07099 1/20 0.33
TP53 P04637 1/20 0.33
CYP1A2 P05177 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26287035 0.92 TLR8 (0.40) TLR8HDAC3HDAC1HDAC2CNR2
SCHEMBL1130208 0.91 SLC6A2 (0.34) TLR8HDAC3HDAC1HDAC2CNR2
SCHEMBL1130698 0.91 LTB4R2 (0.39) CNR2ALDH1A1MAPTKMT2A
SCHEMBL6715464 0.91 TLR8 (0.42) TLR8HDAC3HDAC1HDAC2ICMT
Biphenyl SCHEMBL7785983 0.90 TLR8 (0.41) TLR8HDAC3HDAC1HDAC2CNR2
Tetramethylammonium Ion SCHEMBL1130664 0.87 TLR8 (0.40) TLR8HDAC3HDAC1HDAC2ICMT
Tetramethylammonium Ion SCHEMBL29470085 0.87 TLR8 (0.40) TLR8HDAC3HDAC1HDAC2ICMT
SCHEMBL1130405 0.86 TLR8 (0.37) TLR8HDAC3HDAC1HDAC2CNR2
Tetrabuthylammonium SCHEMBL1130718 0.84 TLR8 (0.39) TLR8HDAC3HDAC1HDAC2ICMT
SCHEMBL26287046 0.83 NFE2L2 (0.40) TLR8HDAC3HDAC1HDAC2ICMT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11450445-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2022-09-20 US disclosed
US-20200303086-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-09-24 US disclosed
US-10720259-B2 Electroconductive film and method for manufacturing electroconductive pattern TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2020-07-21 US disclosed
US-20170309363-A1 ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2017-10-26 US disclosed
EP-1323742-B1 Radiation sensitive refractive index changing composition and refractive index changing method JSR CORP (JP) 2011-02-16 EP disclosed
EP-2012198-B1 METHOD AND EQUIPMENT FOR PROCESSING OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDER/REPRODUCER FUJIFILM CORP (JP) 2010-11-24 EP disclosed
US-20100061212-A1 METHOD AND DEVICE FOR OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDING AND REPRODUCING APPARATUS FUJIFILM CORPORATION (JP) 2010-03-11 US disclosed
EP-2012198-A1 METHOD AND EQUIPMENT FOR PROCESSING OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDER/REPRODUCER Fujifilm Corporation (JP) 2009-01-07 EP disclosed
US-7320854-B2 Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent JSR CORPORATION (JP) 2008-01-22 US disclosed
US-7205085-B2 Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern JSR CORPORATION (JP) 2007-04-17 US disclosed
US-20030187119-A1 Radiation-sensitive composition capable of having refractive index distribution JSR CORPORATION (JP) 2003-10-02 US disclosed
US-20030171468-A1 Radiation-sensitive composition changing in refractive index and utilization thereof JSR CORPORATION (JP) 2003-09-11 US disclosed
EP-1331518-A2 Radiation sensitive composition for forming an insulating film, insulating film and display device JSR Corporation (JP) 2003-07-30 EP disclosed
US-20030139486-A1 Radiation sensitive refractive index changing composition and refractive index changing method JSR CORPORATION (JP) 2003-07-24 US disclosed
EP-1323742-A2 Radiation sensitive refractive index changing composition and refractive index changing method JSR Corporation (JP) 2003-07-02 EP disclosed
US-20030064303-A1 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern JSR CORPORATION (JP) 2003-04-03 US disclosed
EP-1235104-A1 COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN JSR Corporation (JP) 2002-08-28 EP disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed