⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1349275 | 0.98 | HSD11B1 (0.30) | — | |
| SCHEMBL2477129 | 0.77 | HSD11B1 (0.33) | — | |
| SCHEMBL6758974 | 0.76 | HSD11B1 (0.32) | — | |
| SCHEMBL7201984 | 0.74 | HSD11B1 (0.31) | — | |
| SCHEMBL1518812 | 0.73 | APLNR (0.34) | — | |
| SCHEMBL2476473 | 0.71 | HSD11B1 (0.36) | — | |
| SCHEMBL6864996 | 0.67 | — | — | |
| SCHEMBL3686492 | 0.67 | SLC1A2 (0.35) | — | |
| SCHEMBL3173540 | 0.66 | SLC6A4 (0.32) | — | |
| SCHEMBL7644965 | 0.66 | SLC6A4 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8334088-B2 | Functionalized carbosilane polymers and photoresist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-18 | — | — | US | disclosed |
| US-8247162-B2 | Methods of forming a pattern using photoresist compositions | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-08-21 | — | — | US | disclosed |
| US-20110045407-A1 | Functionalized Carbosilane Polymers and Photoresist Compositions Containing the Same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-24 | — | — | US | disclosed |
| US-7883828-B2 | generating a resist image with polycarbosilanes as acid generator, having acid labile functionality; high refractive index (n>1.7) and absorbance at 193 nm that is relatively low (A<3.00 mu m-1); aqueous base soluble; suitable for use immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-08 | — | — | US | disclosed |
| US-7824845-B2 | Functionalized carbosilane polymers and photoresist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-02 | — | — | US | disclosed |
| US-20100266966-A1 | Methods of forming a pattern using photoresist compositions | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-10-21 | — | — | US | disclosed |
| US-20090081598-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081597-A1 | generating a resist image with polycarbosilanes as acid generator, having acid labile functionality; high refractive index (n>1.7) and absorbance at 193 nm that is relatively low (A<3.00 mu m-1); aqueous base soluble; suitable for use immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081579-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081585-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-7341818-B2 | Norbornene-type monomers and polymers containing pendent lactone or sultone groups | PROMERUS LLC (US) | 2008-03-11 | — | — | US | disclosed |
| EP-1709486-A2 | NORBORNENE-TYPE MONOMERS AND POLYMERS CONTAINING PENDENT LACTONE OR SULTONE GROUPS | Promerus, LLC (US) | 2006-10-11 | — | — | EP | disclosed |
| US-7101654-B2 | Norbornene-type monomers and polymers containing pendent lactone or sultone groups | PROMERUS LLC (US) | 2006-09-05 | — | — | US | disclosed |
| WO-2005070993-A2 | NORBORNENE-TYPE MONOMERS AND POLYMERS CONTAINING PENDENT LACTONE OR SULTONE GROUPS | PROMERUS LLC (US) | 2005-08-04 | — | — | WO | disclosed |
| US-20050153240-A1 | Norbornene-type monomers and polymers containing pendent lactone or sultone groups | SUMITOMO BAKELITE CO., LTD. (JP) | 2005-07-14 | — | — | US | disclosed |
| US-20050153233-A1 | Norbornene-type monomers and polymers containing pendent lactone or sultone groups | SUMITOMO BAKELITE CO., LTD. (JP) | 2005-07-14 | — | — | US | disclosed |